Laser-induced backward transfer of nanoimprinted polymer elements
Laser-induced backward transfer of nanoimprinted polymer elements
Femtosecond laser-induced backward transfer of transparent photopolymers is demonstrated in the solid state, assisted by a digital micromirror spatial light modulator for producing shaped deposits. Through use of an absorbing silicon carrier substrate, we have been able to successfully transfer solid-phase material, with lateral dimensions as small as ~6 microns. In addition, a carrier of silicon incorporating a photonic waveguide relief structure enables the transfer of imprinted deposits that have been accomplished with surface features exactly complementing those present on the substrate, with an observed minimum feature size of 140 nm.
laser-induced backward transfer, nanoimprint, laser machining, femtosecond laser, laser-induced forward transfer
1-5
Feinäugle, Matthias
5b631cb4-197f-49db-ab27-352cad7ff656
Heath, Dan
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Mills, Ben
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Grant-Jacob, James
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Mashanovich, Goran
c806e262-af80-4836-b96f-319425060051
Eason, Robert
e38684c3-d18c-41b9-a4aa-def67283b020
15 March 2016
Feinäugle, Matthias
5b631cb4-197f-49db-ab27-352cad7ff656
Heath, Dan
d53c269d-90d2-41e6-aa63-a03f8f014d21
Mills, Ben
05f1886e-96ef-420f-b856-4115f4ab36d0
Grant-Jacob, James
c5d144d8-3c43-4195-8e80-edd96bfda91b
Mashanovich, Goran
c806e262-af80-4836-b96f-319425060051
Eason, Robert
e38684c3-d18c-41b9-a4aa-def67283b020
Feinäugle, Matthias, Heath, Dan, Mills, Ben, Grant-Jacob, James, Mashanovich, Goran and Eason, Robert
(2016)
Laser-induced backward transfer of nanoimprinted polymer elements.
Applied Physics A, 122 (4), , [398].
(doi:10.1007/s00339-016-9953-6).
Abstract
Femtosecond laser-induced backward transfer of transparent photopolymers is demonstrated in the solid state, assisted by a digital micromirror spatial light modulator for producing shaped deposits. Through use of an absorbing silicon carrier substrate, we have been able to successfully transfer solid-phase material, with lateral dimensions as small as ~6 microns. In addition, a carrier of silicon incorporating a photonic waveguide relief structure enables the transfer of imprinted deposits that have been accomplished with surface features exactly complementing those present on the substrate, with an observed minimum feature size of 140 nm.
Text
APA_LIBT_M_Feinaeugle_accepted_manuscript_20160318.pdf
- Accepted Manuscript
More information
Submitted date: 19 November 2015
Accepted/In Press date: 29 February 2016
e-pub ahead of print date: 15 March 2016
Published date: 15 March 2016
Additional Information:
Data related to this article is found at: doi:10.5258/SOTON/381557. Contact: Matthias.Feinaeugle@soton.ac.uk
Keywords:
laser-induced backward transfer, nanoimprint, laser machining, femtosecond laser, laser-induced forward transfer
Organisations:
Optoelectronics Research Centre
Identifiers
Local EPrints ID: 381939
URI: http://eprints.soton.ac.uk/id/eprint/381939
ISSN: 0947-8396
PURE UUID: 97940254-1ff6-4a38-be1f-bcd9167485f9
Catalogue record
Date deposited: 18 Mar 2016 16:49
Last modified: 29 Oct 2024 02:45
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