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The influence of nitrogen and oxygen additions on the thermal characteristics of aluminium-based thin films

The influence of nitrogen and oxygen additions on the thermal characteristics of aluminium-based thin films
The influence of nitrogen and oxygen additions on the thermal characteristics of aluminium-based thin films
The ternary aluminium oxynitride (AlNxOy) system offers the possibility to obtain a wide range of properties by tailoring the ratio between pure Al, AlNx and AlOy and therefore opening a significant number of possible applications. In this work the thermal behaviour of AlNxOy thin films was analysed by modulated infrared radiometry (MIRR), taking as reference the binary AlOy and AlNx systems. MIRR is a non-contact and non-destructive thermal wave measurement technique based on the excitation, propagation and detection of temperature oscillations of very small amplitudes. The intended change of the partial pressure of the reactive gas (N2 and/or O2) influenced the target condition and hence the deposition characteristics which, altogether, affected the composition and microstructure of the films. Based on the MIRR measurements and their qualitative and quantitative interpretation, some correlations between the thermal transport properties of the films and their chemical/physical properties have been found. Furthermore, the potential of such technique applied in this oxynitride system, which present a wide range of different physical responses, is also discussed. The experimental results obtained are consistent with those reported in previous works and show a high potential to fulfil the demands needed for the possible applications of the systems studied. They are clearly indicative of an adequate thermal response if this particular thin film system is aimed to be applied in small sensor devices or in electrodes for biosignal acquisition, such as those for electroencephalography or electromyography as it is the case of the main research area that is being developed in the group.
sputtering, thin films, nitrides, oxides, microstructure, thermal properties
0254-0584
569-580
Borges, J.
c8e5c89d-68cf-454e-a7c3-4f4629f32120
Macedo, F.
fbea945f-3a01-4940-bb99-2289a75fdc4a
Couto, F.M.
34ac8077-0602-4802-824b-d6d7c9d9a31d
Rodrigues, M.S.
8ee697c5-af21-45e7-b905-a1f76b4c0b47
Lopes, C.
75ae989a-13d8-46e4-9781-14d7dfc32045
Pedrosa, P.
4e26f035-75f1-45c0-a6ff-0a879b52b2fd
Polcar, T.
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2
Marques, L.
b0c847e1-10db-41d5-84ca-0af5c88d7e7f
Vaz, F.
ba6841e6-8ce6-4015-a24e-8538df435147
Borges, J.
c8e5c89d-68cf-454e-a7c3-4f4629f32120
Macedo, F.
fbea945f-3a01-4940-bb99-2289a75fdc4a
Couto, F.M.
34ac8077-0602-4802-824b-d6d7c9d9a31d
Rodrigues, M.S.
8ee697c5-af21-45e7-b905-a1f76b4c0b47
Lopes, C.
75ae989a-13d8-46e4-9781-14d7dfc32045
Pedrosa, P.
4e26f035-75f1-45c0-a6ff-0a879b52b2fd
Polcar, T.
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2
Marques, L.
b0c847e1-10db-41d5-84ca-0af5c88d7e7f
Vaz, F.
ba6841e6-8ce6-4015-a24e-8538df435147

Borges, J., Macedo, F., Couto, F.M., Rodrigues, M.S., Lopes, C., Pedrosa, P., Polcar, T., Marques, L. and Vaz, F. (2015) The influence of nitrogen and oxygen additions on the thermal characteristics of aluminium-based thin films. Materials Chemistry and Physics, 163, 569-580. (doi:10.1016/j.matchemphys.2015.08.015).

Record type: Article

Abstract

The ternary aluminium oxynitride (AlNxOy) system offers the possibility to obtain a wide range of properties by tailoring the ratio between pure Al, AlNx and AlOy and therefore opening a significant number of possible applications. In this work the thermal behaviour of AlNxOy thin films was analysed by modulated infrared radiometry (MIRR), taking as reference the binary AlOy and AlNx systems. MIRR is a non-contact and non-destructive thermal wave measurement technique based on the excitation, propagation and detection of temperature oscillations of very small amplitudes. The intended change of the partial pressure of the reactive gas (N2 and/or O2) influenced the target condition and hence the deposition characteristics which, altogether, affected the composition and microstructure of the films. Based on the MIRR measurements and their qualitative and quantitative interpretation, some correlations between the thermal transport properties of the films and their chemical/physical properties have been found. Furthermore, the potential of such technique applied in this oxynitride system, which present a wide range of different physical responses, is also discussed. The experimental results obtained are consistent with those reported in previous works and show a high potential to fulfil the demands needed for the possible applications of the systems studied. They are clearly indicative of an adequate thermal response if this particular thin film system is aimed to be applied in small sensor devices or in electrodes for biosignal acquisition, such as those for electroencephalography or electromyography as it is the case of the main research area that is being developed in the group.

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Accepted/In Press date: 9 August 2015
e-pub ahead of print date: 19 August 2015
Published date: August 2015
Keywords: sputtering, thin films, nitrides, oxides, microstructure, thermal properties
Organisations: nCATS Group

Identifiers

Local EPrints ID: 382600
URI: http://eprints.soton.ac.uk/id/eprint/382600
ISSN: 0254-0584
PURE UUID: 32daf818-938e-4e82-8123-78e7bad008d2
ORCID for T. Polcar: ORCID iD orcid.org/0000-0002-0863-6287

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Date deposited: 02 Nov 2015 13:44
Last modified: 20 Jul 2019 00:43

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Contributors

Author: J. Borges
Author: F. Macedo
Author: F.M. Couto
Author: M.S. Rodrigues
Author: C. Lopes
Author: P. Pedrosa
Author: T. Polcar ORCID iD
Author: L. Marques
Author: F. Vaz

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