Tensile strain of germanium micro-disks on freestanding SiO2 beams
Tensile strain of germanium micro-disks on freestanding SiO2 beams
Tensile strain is crucial to expect the direct recombination in germanium (Ge), towards monolithic light sources on silicon (Si). Freestanding beams of Ge are known to produce strong tensile strain, however, it is not trivial to construct a cavity in a freestanding structure. Here, we fabricated Ge micro-disks on freestanding oxide beams, and observed Whispering-Gallery-Modes (WGM) by photoluminescence. The tensile strain was larger in shorter beams, which is consistent with simulations.
Al-Attili, Abdelrahman
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Kako, Satoshi
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Husain, Muhammad
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Gardes, Frederic
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Iwamoto, Satoshi
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Arakawa, Yasuhiko
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Saito, Shinichi
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Al-Attili, Abdelrahman
534a1c1f-3f8c-4a78-b71b-50c156e23373
Kako, Satoshi
f69c5167-7bf1-49de-bcf2-ce9257d77e4c
Husain, Muhammad
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Gardes, Frederic
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Iwamoto, Satoshi
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Arakawa, Yasuhiko
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Saito, Shinichi
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Al-Attili, Abdelrahman, Kako, Satoshi, Husain, Muhammad, Gardes, Frederic, Iwamoto, Satoshi, Arakawa, Yasuhiko and Saito, Shinichi
(2015)
Tensile strain of germanium micro-disks on freestanding SiO2 beams.
International Conference on Solid-State Devices and Materials (SSDM 2015), Sapporo, Japan.
27 - 29 Sep 2015.
(In Press)
Record type:
Conference or Workshop Item
(Paper)
Abstract
Tensile strain is crucial to expect the direct recombination in germanium (Ge), towards monolithic light sources on silicon (Si). Freestanding beams of Ge are known to produce strong tensile strain, however, it is not trivial to construct a cavity in a freestanding structure. Here, we fabricated Ge micro-disks on freestanding oxide beams, and observed Whispering-Gallery-Modes (WGM) by photoluminescence. The tensile strain was larger in shorter beams, which is consistent with simulations.
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Tensilestrain-Gemicrodisks-AlAttili.pdf
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Accepted/In Press date: 16 July 2015
Venue - Dates:
International Conference on Solid-State Devices and Materials (SSDM 2015), Sapporo, Japan, 2015-09-27 - 2015-09-29
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 383892
URI: http://eprints.soton.ac.uk/id/eprint/383892
PURE UUID: b341f636-443d-455c-a2a0-0b6a81b5f07a
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Date deposited: 12 Jan 2016 15:00
Last modified: 15 Mar 2024 03:43
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Contributors
Author:
Abdelrahman Al-Attili
Author:
Satoshi Kako
Author:
Muhammad Husain
Author:
Frederic Gardes
Author:
Satoshi Iwamoto
Author:
Yasuhiko Arakawa
Author:
Shinichi Saito
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