Achromatic polarization rotator imprinted by ultrafast laser nanostructuring in glass
Achromatic polarization rotator imprinted by ultrafast laser nanostructuring in glass
We demonstrate achromatic polarization rotators implemented by femtosecond laser assisted nanostructuring of silica glass. The rotation of polarization plane results from the chiral arrangement of optical axis embedded in the multi-layered stack of birefringent layers. In our experiments, we achieved rotation of 46.0 ± 0.6° and 93 ± 6° in the broad spectral range of 600-1600 nm, which can be extended even further up to 5 µm. These silica birefringent optical components exhibit advantages over liquid crystal polarizing devices or broadband crystalline waveplates, including large acceptance angle, high thermal stability, and high damage threshold.
181111
Desmarchelier, R.
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Lancry, M.
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Gecevičius, M.
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Beresna, M.
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Kazansky, P.G.
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Poumellec, B.
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2015
Desmarchelier, R.
0b5cd05d-0f50-42ab-9761-8bc5ed610952
Lancry, M.
8cd458c2-f2bd-4fc3-8dca-49c430741278
Gecevičius, M.
271576ee-dd9d-40b3-ab2f-19686b91dc64
Beresna, M.
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Kazansky, P.G.
a5d123ec-8ea8-408c-8963-4a6d921fd76c
Poumellec, B.
852a9506-af6c-4671-9e91-e2567fc17ab6
Desmarchelier, R., Lancry, M., Gecevičius, M., Beresna, M., Kazansky, P.G. and Poumellec, B.
(2015)
Achromatic polarization rotator imprinted by ultrafast laser nanostructuring in glass.
Applied Physics Letters, 107 (18), .
(doi:10.1063/1.4934866).
Abstract
We demonstrate achromatic polarization rotators implemented by femtosecond laser assisted nanostructuring of silica glass. The rotation of polarization plane results from the chiral arrangement of optical axis embedded in the multi-layered stack of birefringent layers. In our experiments, we achieved rotation of 46.0 ± 0.6° and 93 ± 6° in the broad spectral range of 600-1600 nm, which can be extended even further up to 5 µm. These silica birefringent optical components exhibit advantages over liquid crystal polarizing devices or broadband crystalline waveplates, including large acceptance angle, high thermal stability, and high damage threshold.
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Published date: 2015
Organisations:
Optoelectronics Research Centre
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Local EPrints ID: 384260
URI: http://eprints.soton.ac.uk/id/eprint/384260
ISSN: 0003-6951
PURE UUID: 7853379a-c823-46b6-b907-f38c9c4c151f
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Date deposited: 26 Nov 2015 14:32
Last modified: 14 Mar 2024 21:56
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Contributors
Author:
R. Desmarchelier
Author:
M. Lancry
Author:
M. Gecevičius
Author:
M. Beresna
Author:
P.G. Kazansky
Author:
B. Poumellec
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