The effects of varied deposition conditions, including the use of argon, on thin-film silicon solar cells prepared using PECVD
The effects of varied deposition conditions, including the use of argon, on thin-film silicon solar cells prepared using PECVD
This paper reports the effects of varied deposition conditions on the resultant energy conversion efficiencies of thin-film silicon solar cells. Cells were deposited using an Oxford Instruments PlasmaLab System 100 on to Pilkington TEC-8 TCO glass, and thoroughly investigated using electrical methods. Thin film devices were fabricated using the decomposition of silane gas within a reaction chamber of 13.56 MHz plasma discharge. The deposition conditions, including substrate temperature, gas flow rates, RF power, chamber pressure, and film thickness are all explored to determine the optimum cell performance. A view toward high-efficiency solar structures, including hetero-junction with intrinsic thin layer (HIT) and micro-morph cell designs using the same conditions is presented.
91-113
Crudgington, L.J.
33773b09-758e-459e-8a98-50a44f75b16c
Rind, M.A.
64d4bb06-c2e1-455f-bdd6-2a81c3db1375
Payne, D.N.R
96507d14-3421-4677-9644-46e71f1c6636
Bagnall, D.M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
8 April 2014
Crudgington, L.J.
33773b09-758e-459e-8a98-50a44f75b16c
Rind, M.A.
64d4bb06-c2e1-455f-bdd6-2a81c3db1375
Payne, D.N.R
96507d14-3421-4677-9644-46e71f1c6636
Bagnall, D.M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Crudgington, L.J., Rind, M.A., Payne, D.N.R and Bagnall, D.M.
(2014)
The effects of varied deposition conditions, including the use of argon, on thin-film silicon solar cells prepared using PECVD.
Molecular Crystals and Liquid Crystals, 591, .
(doi:10.1080/15421406.2013.827855).
Abstract
This paper reports the effects of varied deposition conditions on the resultant energy conversion efficiencies of thin-film silicon solar cells. Cells were deposited using an Oxford Instruments PlasmaLab System 100 on to Pilkington TEC-8 TCO glass, and thoroughly investigated using electrical methods. Thin film devices were fabricated using the decomposition of silane gas within a reaction chamber of 13.56 MHz plasma discharge. The deposition conditions, including substrate temperature, gas flow rates, RF power, chamber pressure, and film thickness are all explored to determine the optimum cell performance. A view toward high-efficiency solar structures, including hetero-junction with intrinsic thin layer (HIT) and micro-morph cell designs using the same conditions is presented.
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Accepted/In Press date: 16 July 2013
e-pub ahead of print date: 8 April 2014
Published date: 8 April 2014
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 384644
URI: http://eprints.soton.ac.uk/id/eprint/384644
ISSN: 1542-1406
PURE UUID: 9a057b85-451c-4df5-9709-a5273de3ef21
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Date deposited: 05 Jan 2016 14:14
Last modified: 14 Mar 2024 22:02
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Author:
L.J. Crudgington
Author:
M.A. Rind
Author:
D.N.R Payne
Author:
D.M. Bagnall
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