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Optical properties of 2D fractional Talbot patterns under coherent EUV illumination

Optical properties of 2D fractional Talbot patterns under coherent EUV illumination
Optical properties of 2D fractional Talbot patterns under coherent EUV illumination
We investigate optical properties of (2D) fractional Talbot patterns under illumination with EUV laser light. The fractional Talbot effect, due to spatial frequency multiplication, can enable patterning of micro and nano-structures with various feature sizes using a micro-scale pitch mask. The experiment is performed with a free-standing mask fabricated by focused ion beam milling and a highly coherent illumination at 46.9 nm wavelength generated by a compact capillary discharge Ne-like Argon laser. As a result of spatial frequency multiplication, structure density of a square array of apertures in the mask was increased by a factor of up to 9 at the recording plane. The depth of field of the fractional Talbot images has been investigated using Fresnel diffraction analysis. Added field distribution complexity caused by asymmetry of the 2D arrays was observed both in simulation and in the experiment. This approach could be useful for sub-micron structuring of 2D patterns for various applications including among others the fabrication of photonic crystals, quantum dots, and also of submicron-electronic devices.
0022-3727
1-8
Kim, Hyun-su
39359bf5-7ed4-4524-ba57-f8ce78468b5a
Li, W.
df7f882b-64c1-41ca-9ff6-bafa6a24ca42
Danylyuk, S.
7a8e1260-ec7b-4ce2-b693-9b0eab534272
Brocklesby, W.S.
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Marconi, M.C.
98f01ce7-23e7-44dc-9609-e5ab692078ba
Juschkin, L.
9aab7dc5-7599-48e1-93f8-77ea7adf4687
Kim, Hyun-su
39359bf5-7ed4-4524-ba57-f8ce78468b5a
Li, W.
df7f882b-64c1-41ca-9ff6-bafa6a24ca42
Danylyuk, S.
7a8e1260-ec7b-4ce2-b693-9b0eab534272
Brocklesby, W.S.
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Marconi, M.C.
98f01ce7-23e7-44dc-9609-e5ab692078ba
Juschkin, L.
9aab7dc5-7599-48e1-93f8-77ea7adf4687

Kim, Hyun-su, Li, W., Danylyuk, S., Brocklesby, W.S., Marconi, M.C. and Juschkin, L. (2015) Optical properties of 2D fractional Talbot patterns under coherent EUV illumination. Journal of Physics D: Applied Physics, 48 (37), 1-8. (doi:10.1088/0022-3727/48/37/375101).

Record type: Article

Abstract

We investigate optical properties of (2D) fractional Talbot patterns under illumination with EUV laser light. The fractional Talbot effect, due to spatial frequency multiplication, can enable patterning of micro and nano-structures with various feature sizes using a micro-scale pitch mask. The experiment is performed with a free-standing mask fabricated by focused ion beam milling and a highly coherent illumination at 46.9 nm wavelength generated by a compact capillary discharge Ne-like Argon laser. As a result of spatial frequency multiplication, structure density of a square array of apertures in the mask was increased by a factor of up to 9 at the recording plane. The depth of field of the fractional Talbot images has been investigated using Fresnel diffraction analysis. Added field distribution complexity caused by asymmetry of the 2D arrays was observed both in simulation and in the experiment. This approach could be useful for sub-micron structuring of 2D patterns for various applications including among others the fabrication of photonic crystals, quantum dots, and also of submicron-electronic devices.

Full text not available from this repository.

More information

Accepted/In Press date: 27 July 2015
Published date: 21 August 2015
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 385692
URI: https://eprints.soton.ac.uk/id/eprint/385692
ISSN: 0022-3727
PURE UUID: 77fe0ee3-ec20-4d92-bc52-7969622f1402
ORCID for W.S. Brocklesby: ORCID iD orcid.org/0000-0002-2123-6712

Catalogue record

Date deposited: 13 Jan 2016 11:01
Last modified: 20 Jul 2019 01:25

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