Fractional Talbot lithography with extreme ultraviolet light
Fractional Talbot lithography with extreme ultraviolet light
Fractional Talbot effect leads to the possibility to implement patterning of structures with smaller periods than the master mask. This is particularly attractive when using short wavelength illumination in the extreme ultraviolet because of attainable resolution in the sub-100-nm range. In this Letter, we demonstrate the Talbot lithography with the fractional Talbot effect under coherent illumination generated with a capillary discharge Ne-like Ar extreme ultraviolet laser. Various spatial frequency multiplications up to 5x are achieved using a parent grating. This technique allows a fabrication of nanostructures with high-resolution patterns, which is of high interest in many applications such as the manufacturing of plasmonic surfaces and photonic devices.
6969-6972
Kim, Hyun-su
39359bf5-7ed4-4524-ba57-f8ce78468b5a
Li, Wei
ab5e097b-b347-4edf-95dd-2b245edf0f81
Danylyuk, Serhiy
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Brocklesby, William S.
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Marconi, Mario C.
02b0a766-aabe-4965-870b-f075c3efd6ac
Juschkin, Larissa
14157640-798a-4f51-ad7b-412ea6ddccb4
15 December 2014
Kim, Hyun-su
39359bf5-7ed4-4524-ba57-f8ce78468b5a
Li, Wei
ab5e097b-b347-4edf-95dd-2b245edf0f81
Danylyuk, Serhiy
10b87022-5625-40ff-b494-2c4bb6fe5a51
Brocklesby, William S.
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Marconi, Mario C.
02b0a766-aabe-4965-870b-f075c3efd6ac
Juschkin, Larissa
14157640-798a-4f51-ad7b-412ea6ddccb4
Kim, Hyun-su, Li, Wei, Danylyuk, Serhiy, Brocklesby, William S., Marconi, Mario C. and Juschkin, Larissa
(2014)
Fractional Talbot lithography with extreme ultraviolet light.
Optics Letters, 39 (24), .
(doi:10.1364/OL.39.006969).
Abstract
Fractional Talbot effect leads to the possibility to implement patterning of structures with smaller periods than the master mask. This is particularly attractive when using short wavelength illumination in the extreme ultraviolet because of attainable resolution in the sub-100-nm range. In this Letter, we demonstrate the Talbot lithography with the fractional Talbot effect under coherent illumination generated with a capillary discharge Ne-like Ar extreme ultraviolet laser. Various spatial frequency multiplications up to 5x are achieved using a parent grating. This technique allows a fabrication of nanostructures with high-resolution patterns, which is of high interest in many applications such as the manufacturing of plasmonic surfaces and photonic devices.
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Accepted/In Press date: 5 November 2014
e-pub ahead of print date: 14 November 2014
Published date: 15 December 2014
Organisations:
Optoelectronics Research Centre
Identifiers
Local EPrints ID: 386347
URI: http://eprints.soton.ac.uk/id/eprint/386347
ISSN: 0146-9592
PURE UUID: a8dc34f8-edc7-4515-92b5-76a713f61dc4
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Date deposited: 25 Jan 2016 14:40
Last modified: 15 Mar 2024 02:41
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Contributors
Author:
Hyun-su Kim
Author:
Wei Li
Author:
Serhiy Danylyuk
Author:
Mario C. Marconi
Author:
Larissa Juschkin
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