Morgan, Hywel, Kalsi, Sumit, de Planque, Maurits R.R. and Kiang, Kian Shen (Inventors) (2016) Method for fabricating at least one aperture with shaped sidewalls in a layer of a light sensitive photopolymer (US 2016/0062239).
Record type:
Patent
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More information
Submitted date: 15 May 2015
Published date: 3 March 2016
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 393313
URI: http://eprints.soton.ac.uk/id/eprint/393313
PURE UUID: 94f1f1ec-efee-46c7-bdc4-6b8cb0c3d543
Catalogue record
Date deposited: 24 Apr 2016 11:01
Last modified: 12 Dec 2021 03:40
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Contributors
Inventor:
Hywel Morgan
Inventor:
Sumit Kalsi
Inventor:
Maurits R.R. de Planque
Inventor:
Kian Shen Kiang
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