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Method for fabricating at least one aperture with shaped sidewalls in a layer of a light sensitive photopolymer (US 2016/0062239)

Method for fabricating at least one aperture with shaped sidewalls in a layer of a light sensitive photopolymer (US 2016/0062239)
Method for fabricating at least one aperture with shaped sidewalls in a layer of a light sensitive photopolymer (US 2016/0062239)
Morgan, Hywel
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Kalsi, Sumit
65cb3d4c-c28c-490a-85a3-7a8fb96ecfee
de Planque, Maurits R.R.
a1d33d13-f516-44fb-8d2c-c51d18bc21ba
Kiang, Kian Shen
fdb609c6-75aa-4893-85c8-8e50edfda7fe

Morgan, Hywel, Kalsi, Sumit, de Planque, Maurits R.R. and Kiang, Kian Shen (Inventors) (2016) Method for fabricating at least one aperture with shaped sidewalls in a layer of a light sensitive photopolymer (US 2016/0062239).

Record type: Patent

Full text not available from this repository.

More information

Submitted date: 15 May 2015
Published date: 3 March 2016
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 393313
URI: http://eprints.soton.ac.uk/id/eprint/393313
PURE UUID: 94f1f1ec-efee-46c7-bdc4-6b8cb0c3d543
ORCID for Hywel Morgan: ORCID iD orcid.org/0000-0003-4850-5676
ORCID for Maurits R.R. de Planque: ORCID iD orcid.org/0000-0002-8787-0513
ORCID for Kian Shen Kiang: ORCID iD orcid.org/0000-0002-7326-909X

Catalogue record

Date deposited: 24 Apr 2016 11:01
Last modified: 06 Jun 2018 12:45

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Contributors

Inventor: Hywel Morgan ORCID iD
Inventor: Sumit Kalsi
Inventor: Maurits R.R. de Planque ORCID iD
Inventor: Kian Shen Kiang ORCID iD

University divisions

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