Data for Lloyd’s mirror interference lithography with the EUV radiation from a high harmonic source
Data for Lloyd’s mirror interference lithography with the EUV radiation from a high harmonic source
We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced using high harmonic generation with 800 nm light from a femtosecond Ti:Sapphire laser (40 fs pulses, 1 kHz, 2W average power) in argon gas. Interference patterns created using a Lloyd’s mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using ZEP-520A photoresist, producing features with < 200 nm pitch. The influence of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.
high harmonic generation, interference lithography, extreme ultraviolet, pulsed radiation
University of Southampton
Kim, Hyunsu
39359bf5-7ed4-4524-ba57-f8ce78468b5a
Baksh, Peter
578fea83-9a1c-4dd0-b3f6-66f5552f2344
Odstrcil, Michal
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Miszczak, Magdalena
7aeee058-080d-498a-9833-37a0dd8c60b0
Frey, Jeremy G.
ba60c559-c4af-44f1-87e6-ce69819bf23f
Juschkin, Larissa
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Brocklesby, William
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Kim, Hyunsu
39359bf5-7ed4-4524-ba57-f8ce78468b5a
Baksh, Peter
578fea83-9a1c-4dd0-b3f6-66f5552f2344
Odstrcil, Michal
b297d3ec-ed42-4709-9f90-7af79d0644c7
Miszczak, Magdalena
7aeee058-080d-498a-9833-37a0dd8c60b0
Frey, Jeremy G.
ba60c559-c4af-44f1-87e6-ce69819bf23f
Juschkin, Larissa
14157640-798a-4f51-ad7b-412ea6ddccb4
Brocklesby, William
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Kim, Hyunsu, Baksh, Peter, Odstrcil, Michal, Miszczak, Magdalena, Frey, Jeremy G., Juschkin, Larissa and Brocklesby, William
(2016)
Data for Lloyd’s mirror interference lithography with the EUV radiation from a high harmonic source.
University of Southampton
doi:10.5258/SOTON/396256
[Dataset]
Abstract
We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced using high harmonic generation with 800 nm light from a femtosecond Ti:Sapphire laser (40 fs pulses, 1 kHz, 2W average power) in argon gas. Interference patterns created using a Lloyd’s mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using ZEP-520A photoresist, producing features with < 200 nm pitch. The influence of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.
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More information
Published date: 3 June 2016
Keywords:
high harmonic generation, interference lithography, extreme ultraviolet, pulsed radiation
Organisations:
Optoelectronics Research Centre, Computational Systems Chemistry, Southampton Marine & Maritime Institute, Institute for Life Sciences
Identifiers
Local EPrints ID: 396256
URI: http://eprints.soton.ac.uk/id/eprint/396256
PURE UUID: bcddf68e-d0c9-4cf9-a8cb-66d1d21f3a75
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Date deposited: 17 Jan 2018 17:31
Last modified: 07 Nov 2023 02:32
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Contributors
Creator:
Hyunsu Kim
Creator:
Peter Baksh
Creator:
Michal Odstrcil
Creator:
Magdalena Miszczak
Creator:
Larissa Juschkin
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