Optimised atmospheric pressure CVD of monoclinic VO2 thin films with picosecond phase transition
Optimised atmospheric pressure CVD of monoclinic VO2 thin films with picosecond phase transition
 
  Monoclinic vanadium oxide (VO2) thin films with low roughness values were deposited and optimised by atmospheric pressure chemical vapour deposition using vanadium tetrachloride (VCl4) and water (H2O). Smooth VO2 films with good transmittance properties were successfully produced on fluorine doped tin oxide/borosilicate substrates. Systematic investigations confirmed that the quality (including phase) of films being produced strongly depended on substrate, deposition time, temperature, and precursor ratio within the process. Optical characterisation using ellipsometry revealed a strong thermochromic response of the films with a large change in the dielectric function, while time-resolved pump–probe transmission showed the picosecond nature of the phase transition
  
  
  160-165
  
    
      Gaskell, Jeffrey M.
      
        9ee4a136-dcdc-4325-a6fb-509d55af6f1d
      
     
  
    
      Afzaal, Mohammad
      
        15c0c0f8-acd5-4e73-9b23-e1aa8f2c42d3
      
     
  
    
      Sheel, David W.
      
        e18a1ba6-034a-475a-bd05-c2f1c333d351
      
     
  
    
      Yates, Heather M.
      
        41d55fe8-8530-4882-bc60-2261bfc315f8
      
     
  
    
      Delfanazari, Kaveh
      
        e538911f-2398-4d3f-952f-ff2d908213b0
      
     
  
    
      Muskens, Otto
      
        2284101a-f9ef-4d79-8951-a6cda5bfc7f9
      
     
  
  
   
  
  
    
    
  
    
      6 January 2016
    
    
  
  
    
      Gaskell, Jeffrey M.
      
        9ee4a136-dcdc-4325-a6fb-509d55af6f1d
      
     
  
    
      Afzaal, Mohammad
      
        15c0c0f8-acd5-4e73-9b23-e1aa8f2c42d3
      
     
  
    
      Sheel, David W.
      
        e18a1ba6-034a-475a-bd05-c2f1c333d351
      
     
  
    
      Yates, Heather M.
      
        41d55fe8-8530-4882-bc60-2261bfc315f8
      
     
  
    
      Delfanazari, Kaveh
      
        e538911f-2398-4d3f-952f-ff2d908213b0
      
     
  
    
      Muskens, Otto
      
        2284101a-f9ef-4d79-8951-a6cda5bfc7f9
      
     
  
       
    
 
  
    
      
  
  
  
  
  
  
    Gaskell, Jeffrey M., Afzaal, Mohammad, Sheel, David W., Yates, Heather M., Delfanazari, Kaveh and Muskens, Otto
  
  
  
  
   
    (2016)
  
  
    
    Optimised atmospheric pressure CVD of monoclinic VO2 thin films with picosecond phase transition.
  
  
  
  
    Surface and Coatings Technology, 287, .
  
   (doi:10.1016/j.surfcoat.2015.12.090). 
  
  
   
  
  
  
  
  
   
  
    
    
      
        
          Abstract
          Monoclinic vanadium oxide (VO2) thin films with low roughness values were deposited and optimised by atmospheric pressure chemical vapour deposition using vanadium tetrachloride (VCl4) and water (H2O). Smooth VO2 films with good transmittance properties were successfully produced on fluorine doped tin oxide/borosilicate substrates. Systematic investigations confirmed that the quality (including phase) of films being produced strongly depended on substrate, deposition time, temperature, and precursor ratio within the process. Optical characterisation using ellipsometry revealed a strong thermochromic response of the films with a large change in the dielectric function, while time-resolved pump–probe transmission showed the picosecond nature of the phase transition
         
      
      
        
          
            
  
    Text
 Gaskell_submitted2016.pdf
     - Accepted Manuscript
   
  
  
    
  
 
          
            
          
            
           
            
           
        
        
       
    
   
  
  
  More information
  
    
      Accepted/In Press date: 31 December 2015
 
    
      Published date: 6 January 2016
 
    
  
  
    
  
    
  
    
  
    
  
    
     
    
  
    
  
    
     
        Organisations:
        Quantum, Light & Matter Group
      
    
  
    
  
  
  
    
  
  
        Identifiers
        Local EPrints ID: 397401
        URI: http://eprints.soton.ac.uk/id/eprint/397401
        
          
        
        
        
          ISSN: 0257-8972
        
        
          PURE UUID: a2017a0e-2357-46b9-a651-c8e9f7072b50
        
  
    
        
          
        
    
        
          
        
    
        
          
        
    
        
          
        
    
        
          
        
    
        
          
            
              
            
          
        
    
  
  Catalogue record
  Date deposited: 30 Jun 2016 13:24
  Last modified: 15 Mar 2024 05:42
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      Contributors
      
          
          Author:
          
            
            
              Jeffrey M. Gaskell
            
          
        
      
          
          Author:
          
            
            
              Mohammad Afzaal
            
          
        
      
          
          Author:
          
            
            
              David W. Sheel
            
          
        
      
          
          Author:
          
            
            
              Heather M. Yates
            
          
        
      
          
          Author:
          
            
            
              Kaveh Delfanazari
            
          
        
      
        
      
      
      
    
  
   
  
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