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Optimised atmospheric pressure CVD of monoclinic VO2 thin films with picosecond phase transition

Optimised atmospheric pressure CVD of monoclinic VO2 thin films with picosecond phase transition
Optimised atmospheric pressure CVD of monoclinic VO2 thin films with picosecond phase transition
Monoclinic vanadium oxide (VO2) thin films with low roughness values were deposited and optimised by atmospheric pressure chemical vapour deposition using vanadium tetrachloride (VCl4) and water (H2O). Smooth VO2 films with good transmittance properties were successfully produced on fluorine doped tin oxide/borosilicate substrates. Systematic investigations confirmed that the quality (including phase) of films being produced strongly depended on substrate, deposition time, temperature, and precursor ratio within the process. Optical characterisation using ellipsometry revealed a strong thermochromic response of the films with a large change in the dielectric function, while time-resolved pump–probe transmission showed the picosecond nature of the phase transition
0257-8972
160-165
Gaskell, Jeffrey M.
9ee4a136-dcdc-4325-a6fb-509d55af6f1d
Afzaal, Mohammad
15c0c0f8-acd5-4e73-9b23-e1aa8f2c42d3
Sheel, David W.
e18a1ba6-034a-475a-bd05-c2f1c333d351
Yates, Heather M.
41d55fe8-8530-4882-bc60-2261bfc315f8
Delfanazari, Kaveh
e538911f-2398-4d3f-952f-ff2d908213b0
Muskens, Otto
2284101a-f9ef-4d79-8951-a6cda5bfc7f9
Gaskell, Jeffrey M.
9ee4a136-dcdc-4325-a6fb-509d55af6f1d
Afzaal, Mohammad
15c0c0f8-acd5-4e73-9b23-e1aa8f2c42d3
Sheel, David W.
e18a1ba6-034a-475a-bd05-c2f1c333d351
Yates, Heather M.
41d55fe8-8530-4882-bc60-2261bfc315f8
Delfanazari, Kaveh
e538911f-2398-4d3f-952f-ff2d908213b0
Muskens, Otto
2284101a-f9ef-4d79-8951-a6cda5bfc7f9

Gaskell, Jeffrey M., Afzaal, Mohammad, Sheel, David W., Yates, Heather M., Delfanazari, Kaveh and Muskens, Otto (2016) Optimised atmospheric pressure CVD of monoclinic VO2 thin films with picosecond phase transition. Surface and Coatings Technology, 287, 160-165. (doi:10.1016/j.surfcoat.2015.12.090).

Record type: Article

Abstract

Monoclinic vanadium oxide (VO2) thin films with low roughness values were deposited and optimised by atmospheric pressure chemical vapour deposition using vanadium tetrachloride (VCl4) and water (H2O). Smooth VO2 films with good transmittance properties were successfully produced on fluorine doped tin oxide/borosilicate substrates. Systematic investigations confirmed that the quality (including phase) of films being produced strongly depended on substrate, deposition time, temperature, and precursor ratio within the process. Optical characterisation using ellipsometry revealed a strong thermochromic response of the films with a large change in the dielectric function, while time-resolved pump–probe transmission showed the picosecond nature of the phase transition

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More information

Accepted/In Press date: 31 December 2015
Published date: 6 January 2016
Organisations: Quantum, Light & Matter Group

Identifiers

Local EPrints ID: 397401
URI: http://eprints.soton.ac.uk/id/eprint/397401
ISSN: 0257-8972
PURE UUID: a2017a0e-2357-46b9-a651-c8e9f7072b50
ORCID for Otto Muskens: ORCID iD orcid.org/0000-0003-0693-5504

Catalogue record

Date deposited: 30 Jun 2016 13:24
Last modified: 17 Dec 2019 06:44

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