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High Density Crossbar Arrays with Sub- 15 nm Single Cells via Liftoff Process Only

High Density Crossbar Arrays with Sub- 15 nm Single Cells via Liftoff Process Only
High Density Crossbar Arrays with Sub- 15 nm Single Cells via Liftoff Process Only
Emerging nano-scale technologies are pushing the fabrication boundaries at their limits, for leveraging an even higher density of nano-devices towards reaching 4F2/cell footprint in 3D arrays. Here, we study the liftoff process limits to achieve extreme dense nanowires while ensuring preservation of thin film quality. The proposed method is optimized for attaining a multiple layer fabrication to reliably achieve 3D nano-device stacks of 32x32 nanowire arrays across 6-inch wafer, using electron beam lithography at 100 kV and polymethyl methacrylate (PMMA) resist at different thicknesses. The resist thickness and its geometric profile after development were identified to be the major limiting factors, and suggestions for addressing these issues are provided. Multiple layers were successfully achieved to fabricate arrays of 1 Ki cells that have sub- 15 nm nanowires distant by 28 nm across 6-inch wafer.This data is related to the published paper: Khiat, Ali, Ayliffe, Peter and Prodromakis, Themis (2016) High density crossbar arrays with sub- 15 nm single cells via liftoff process only. Scientific Reports, 6, (32614), 1-8. (doi:10.1038/srep32614).
University of Southampton
Khiat, Ali
bf549ddd-5356-4a7d-9c12-eb6c0d904050
AYLIFFE, PETER J
a16342dc-c363-48bc-89f0-471bd9d90d74
Prodromakis, Themistoklis
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Khiat, Ali
bf549ddd-5356-4a7d-9c12-eb6c0d904050
AYLIFFE, PETER J
a16342dc-c363-48bc-89f0-471bd9d90d74
Prodromakis, Themistoklis
d58c9c10-9d25-4d22-b155-06c8437acfbf

Khiat, Ali, AYLIFFE, PETER J and Prodromakis, Themistoklis (2016) High Density Crossbar Arrays with Sub- 15 nm Single Cells via Liftoff Process Only. University of Southampton doi:10.5258/SOTON/397940 [Dataset]

Record type: Dataset

Abstract

Emerging nano-scale technologies are pushing the fabrication boundaries at their limits, for leveraging an even higher density of nano-devices towards reaching 4F2/cell footprint in 3D arrays. Here, we study the liftoff process limits to achieve extreme dense nanowires while ensuring preservation of thin film quality. The proposed method is optimized for attaining a multiple layer fabrication to reliably achieve 3D nano-device stacks of 32x32 nanowire arrays across 6-inch wafer, using electron beam lithography at 100 kV and polymethyl methacrylate (PMMA) resist at different thicknesses. The resist thickness and its geometric profile after development were identified to be the major limiting factors, and suggestions for addressing these issues are provided. Multiple layers were successfully achieved to fabricate arrays of 1 Ki cells that have sub- 15 nm nanowires distant by 28 nm across 6-inch wafer.This data is related to the published paper: Khiat, Ali, Ayliffe, Peter and Prodromakis, Themis (2016) High density crossbar arrays with sub- 15 nm single cells via liftoff process only. Scientific Reports, 6, (32614), 1-8. (doi:10.1038/srep32614).

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More information

Published date: 2016
Organisations: Nanoelectronics and Nanotechnology
Projects:
Reliably unreliable nanotechnologies
Funded by: UNSPECIFIED (EP/K017829/1)
2 September 2013 to 1 September 2018

Identifiers

Local EPrints ID: 397940
URI: https://eprints.soton.ac.uk/id/eprint/397940
PURE UUID: 6364bc86-8fc1-41d4-a684-0d9bbd3d0cd5
ORCID for Themistoklis Prodromakis: ORCID iD orcid.org/0000-0002-6267-6909

Catalogue record

Date deposited: 23 Jan 2017 12:09
Last modified: 06 Jun 2018 12:24

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Contributors

Creator: Ali Khiat
Creator: PETER J AYLIFFE

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