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Investigations into the growth of GaN nanowires by MOCVD using azidotrimethylsilane as nitrogen source

Investigations into the growth of GaN nanowires by MOCVD using azidotrimethylsilane as nitrogen source
Investigations into the growth of GaN nanowires by MOCVD using azidotrimethylsilane as nitrogen source
Gallium trichloride (GaCl3) and azidotrimethylsilane (CH3)3SiN3 were employed as alternatives gallium and nitrogen precursors respectively in the growth of GaN nanowires via a metal-organic chemical vapor deposition (MOCVD) system. Au pre-deposition on Si (100) substrate was using as catalysis seed to grown of GaN nanowires. X-Ray, FE-SEM and AFM analyses reveal that nanowires grown at temperature 1050 ºC present morphology characteristic to model VLS. Scanning electron microscopy reveal a surface morphology made up of wurzite that suggests that wires growth involve a melting process. A nucleation and growth mechanism, involving the congruent melting clusters of precursor molecules on the hot substrate surface, is therefore invoked to explain these observations. We attributed the improved growth behavior to the nearer-to-equilibrium growth and may be close to local thermodynamic equilibrium.
1483-1489
Núñez-Velázquez, Martin
3c102956-ac51-4d02-9fe6-6628557cfbff
Lopez, Fernando Juárez
bf77f25a-f02f-48e1-8993-d5e1846e0f1f
Núñez-Velázquez, Martin
3c102956-ac51-4d02-9fe6-6628557cfbff
Lopez, Fernando Juárez
bf77f25a-f02f-48e1-8993-d5e1846e0f1f

Núñez-Velázquez, Martin and Lopez, Fernando Juárez (2014) Investigations into the growth of GaN nanowires by MOCVD using azidotrimethylsilane as nitrogen source. Advanced Materials Research, 875-877, 1483-1489. (doi:10.4028/www.scientific.net/AMR.875-877.1483).

Record type: Article

Abstract

Gallium trichloride (GaCl3) and azidotrimethylsilane (CH3)3SiN3 were employed as alternatives gallium and nitrogen precursors respectively in the growth of GaN nanowires via a metal-organic chemical vapor deposition (MOCVD) system. Au pre-deposition on Si (100) substrate was using as catalysis seed to grown of GaN nanowires. X-Ray, FE-SEM and AFM analyses reveal that nanowires grown at temperature 1050 ºC present morphology characteristic to model VLS. Scanning electron microscopy reveal a surface morphology made up of wurzite that suggests that wires growth involve a melting process. A nucleation and growth mechanism, involving the congruent melting clusters of precursor molecules on the hot substrate surface, is therefore invoked to explain these observations. We attributed the improved growth behavior to the nearer-to-equilibrium growth and may be close to local thermodynamic equilibrium.

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More information

Published date: 27 February 2014
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 398341
URI: http://eprints.soton.ac.uk/id/eprint/398341
PURE UUID: 937617c0-4d34-423c-86db-5f1ca48f628b
ORCID for Martin Núñez-Velázquez: ORCID iD orcid.org/0000-0003-0774-3272

Catalogue record

Date deposited: 22 Jul 2016 10:37
Last modified: 15 Mar 2024 01:33

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Contributors

Author: Martin Núñez-Velázquez ORCID iD
Author: Fernando Juárez Lopez

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