Receding contact lines: from sliding drops to immersion lithography
Receding contact lines: from sliding drops to immersion lithography
Instabilities of receding contact lines often occur through the formation of a corner with a very sharp tip. These dewetting structures also appear in the technology of Immersion Lithography, where water is put between the lens and the silicon wafer to increase the optical resolution. In this paper we aim to compare corners appearing in Immersion Lithography to those at the tail of gravity driven-drops sliding down an incline. We use high speed recordings to measure the dynamic contact angle and the sharpness of the corner, for varying contact line velocity. It is found that these quantities behave very similarly for Immersion Lithography and drops on an incline. In addition, the results agree well with predictions by a lubrication model for cornered contact lines, hinting at a generic structure of dewetting corners.
195-205
Winkels, K.G.
9aadbc9e-ec11-459a-a4a2-962bde461852
Peters, I.R.
222d846e-e620-4017-84cb-099b14ff2d75
Evangelista, F.
96a974a9-a57c-4bf4-97bf-641b1fcd8b51
Riepen, M.
9fe56382-3aed-4cb6-b753-f215e746f7c4
Daerr, A.
889d7050-e535-412f-aeb4-a9b92e4d52df
Limat, L.
c611bdf1-3bea-4ec4-b480-e03be73b02f3
Snoeijer, J.H.
2fcdf456-1708-41cc-a260-7eeddaded2a3
February 2011
Winkels, K.G.
9aadbc9e-ec11-459a-a4a2-962bde461852
Peters, I.R.
222d846e-e620-4017-84cb-099b14ff2d75
Evangelista, F.
96a974a9-a57c-4bf4-97bf-641b1fcd8b51
Riepen, M.
9fe56382-3aed-4cb6-b753-f215e746f7c4
Daerr, A.
889d7050-e535-412f-aeb4-a9b92e4d52df
Limat, L.
c611bdf1-3bea-4ec4-b480-e03be73b02f3
Snoeijer, J.H.
2fcdf456-1708-41cc-a260-7eeddaded2a3
Winkels, K.G., Peters, I.R., Evangelista, F., Riepen, M., Daerr, A., Limat, L. and Snoeijer, J.H.
(2011)
Receding contact lines: from sliding drops to immersion lithography.
European Physical Journal - Special Topics, 192 (1), .
(doi:10.1140/epjst/e2011-01374-6).
Abstract
Instabilities of receding contact lines often occur through the formation of a corner with a very sharp tip. These dewetting structures also appear in the technology of Immersion Lithography, where water is put between the lens and the silicon wafer to increase the optical resolution. In this paper we aim to compare corners appearing in Immersion Lithography to those at the tail of gravity driven-drops sliding down an incline. We use high speed recordings to measure the dynamic contact angle and the sharpness of the corner, for varying contact line velocity. It is found that these quantities behave very similarly for Immersion Lithography and drops on an incline. In addition, the results agree well with predictions by a lubrication model for cornered contact lines, hinting at a generic structure of dewetting corners.
Text
Receding contact lines from sliding drops to immersion lithography.pdf
- Accepted Manuscript
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Published date: February 2011
Organisations:
Aerodynamics & Flight Mechanics Group
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Local EPrints ID: 399975
URI: http://eprints.soton.ac.uk/id/eprint/399975
ISSN: 1951-6355
PURE UUID: 209dc088-4a0f-4cf4-a482-c7be5442491b
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Date deposited: 12 Sep 2016 15:34
Last modified: 15 Mar 2024 03:52
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Author:
K.G. Winkels
Author:
F. Evangelista
Author:
M. Riepen
Author:
A. Daerr
Author:
L. Limat
Author:
J.H. Snoeijer
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