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A polarization splitter and rotator based on a partially etched grating-assisted coupler

A polarization splitter and rotator based on a partially etched grating-assisted coupler
A polarization splitter and rotator based on a partially etched grating-assisted coupler
A fabrication-tolerant mid-infrared silicon polarization splitter and rotator (PSR) based on a partially etched grating-assisted coupler is proposed. The design of the partially etched structure allows to use different cladding layers, such as SiO2, to make the device compatible with the metal back-end of line process. Moreover, by using the grating-assisted coupler, the device is no longer limited by the precise requirement of the coupling length and strength as those in its counterparts based on directional couplers. The simulation results show that the PSR can work over a wide spectral range of 50 nm around the mid-infrared wavelength of 2.5 µm with the typical transverse electric (TE) to transverse magnetic (TM) polarization conversion efficiency of 96.83%, the conversion loss of -0.97 dB, and the polarization crosstalk of -21.48 dB. The TM-to-TM through insertion loss is around -0.76 dB. The effects of the fabrication errors are analyzed. The numerical simulation results demonstrate that the device has a good fabrication tolerance larger than 45 nm.
1041-1135
911-914
Hu, Ting
4dce8d60-2550-42b0-9535-1e49e504ffab
Rouifed, Mohamed Said
c498264d-50f4-4003-9d18-b40f318160e2
Qiu, Haodong
1061098e-e16e-49ad-8068-26f68872db23
Guo, Xin
53a4beb7-8d30-4edb-b409-d5477927fe58
Littlejohns, Callum
d2837f04-0a83-4bf9-acb2-618aa42a0cad
Liu, Chongyong
66d7780d-791e-4481-8aed-d2ffd2e6362a
Wang, Hong
dfd0ec4f-682a-4596-a0d1-171313cc5733
Hu, Ting
4dce8d60-2550-42b0-9535-1e49e504ffab
Rouifed, Mohamed Said
c498264d-50f4-4003-9d18-b40f318160e2
Qiu, Haodong
1061098e-e16e-49ad-8068-26f68872db23
Guo, Xin
53a4beb7-8d30-4edb-b409-d5477927fe58
Littlejohns, Callum
d2837f04-0a83-4bf9-acb2-618aa42a0cad
Liu, Chongyong
66d7780d-791e-4481-8aed-d2ffd2e6362a
Wang, Hong
dfd0ec4f-682a-4596-a0d1-171313cc5733

Hu, Ting, Rouifed, Mohamed Said, Qiu, Haodong, Guo, Xin, Littlejohns, Callum, Liu, Chongyong and Wang, Hong (2016) A polarization splitter and rotator based on a partially etched grating-assisted coupler. IEEE Photonics Technology Letters, 28 (8), 911-914. (doi:10.1109/LPT.2016.2517196).

Record type: Article

Abstract

A fabrication-tolerant mid-infrared silicon polarization splitter and rotator (PSR) based on a partially etched grating-assisted coupler is proposed. The design of the partially etched structure allows to use different cladding layers, such as SiO2, to make the device compatible with the metal back-end of line process. Moreover, by using the grating-assisted coupler, the device is no longer limited by the precise requirement of the coupling length and strength as those in its counterparts based on directional couplers. The simulation results show that the PSR can work over a wide spectral range of 50 nm around the mid-infrared wavelength of 2.5 µm with the typical transverse electric (TE) to transverse magnetic (TM) polarization conversion efficiency of 96.83%, the conversion loss of -0.97 dB, and the polarization crosstalk of -21.48 dB. The TM-to-TM through insertion loss is around -0.76 dB. The effects of the fabrication errors are analyzed. The numerical simulation results demonstrate that the device has a good fabrication tolerance larger than 45 nm.

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A Polarization Splitter and Rotator Based on a Partially Etched Grating-assisted Coupler.pdf - Accepted Manuscript
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Accepted/In Press date: 10 January 2016
e-pub ahead of print date: 12 January 2016
Published date: 15 April 2016
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 400899
URI: http://eprints.soton.ac.uk/id/eprint/400899
ISSN: 1041-1135
PURE UUID: 2ff7040a-5184-495c-ae42-5bcd2ddbdfe0

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Date deposited: 29 Sep 2016 10:41
Last modified: 09 Mar 2020 17:33

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