Low-loss silicon slot waveguide realized by surface roughness reduction
Low-loss silicon slot waveguide realized by surface roughness reduction
We demonstrate low-loss slot waveguides on silicon-on-insulator (SOI) platform. Waveguides oriented to the <11-2> direction on the Si (110) plane are fabricated by a combination of dry and wet etching to realize propagation loss of 4dB/cm for a waveguide with a slot width of 120nm.
Debnath, Kapil
aa01749d-524b-4464-b90a-af072e92a02f
Khokhar, Ali
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Reed, Graham
ca08dd60-c072-4d7d-b254-75714d570139
Saito, Shin
14a5d20b-055e-4f48-9dda-267e88bd3fdc
10 November 2016
Debnath, Kapil
aa01749d-524b-4464-b90a-af072e92a02f
Khokhar, Ali
2eedd1cc-8ac5-4f8e-be25-930bd3eae396
Reed, Graham
ca08dd60-c072-4d7d-b254-75714d570139
Saito, Shin
14a5d20b-055e-4f48-9dda-267e88bd3fdc
Debnath, Kapil, Khokhar, Ali, Reed, Graham and Saito, Shin
(2016)
Low-loss silicon slot waveguide realized by surface roughness reduction.
In 2016 IEEE 13th International Conference on Group IV photonics (GFP).
IEEE.
2 pp
.
(doi:10.1109/GROUP4.2016.7739069).
Record type:
Conference or Workshop Item
(Paper)
Abstract
We demonstrate low-loss slot waveguides on silicon-on-insulator (SOI) platform. Waveguides oriented to the <11-2> direction on the Si (110) plane are fabricated by a combination of dry and wet etching to realize propagation loss of 4dB/cm for a waveguide with a slot width of 120nm.
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Accepted/In Press date: 8 July 2016
Published date: 10 November 2016
Venue - Dates:
2016 IEEE 13th International Conference on Group IV Photonics (GFP), , Shanghai, China, 2016-08-24 - 2016-08-26
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 403675
URI: http://eprints.soton.ac.uk/id/eprint/403675
PURE UUID: f65ad0a6-e09b-4889-aa07-70c50808eaef
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Date deposited: 08 Dec 2016 15:40
Last modified: 16 Mar 2024 04:11
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Contributors
Author:
Kapil Debnath
Author:
Ali Khokhar
Author:
Graham Reed
Author:
Shin Saito
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