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Dataset for Helium Ion Beam Lithography on Fullerene Molecular Resists for Sub-10 nm Patterning

Record type: Dataset

Dataset supporting: Shi, Xiaoqing et al (2016) Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning. Microelectronic Engineering.Helium ion beam lithography (HIBL) is an emerging technique that uses a sub-nanometre focused beam of helium ions generated in the helium ion microscope to expose resist. It benefits from high resolution, high sensitivity and a low proximity effect. Here we present an investigation into HIBL on a novel, negative tone fullerene-derivative molecular resist. Analysis of large area exposures reveals a sensitivity of ~40 ?C/cm2 with a 30 keV helium beam which is almost three orders of magnitude higher than the sensitivity of this resist to a 30 keV electron beam. Sparse line features with line widths of 7.3 nm are achieved on the ~10 nm thick resist. The fabrication of 8.5 half-pitched lines with good feature separation and 6 nm half-pitched lines with inferior but still resolvable separation are also shown in this study. Thus, sub-10 nm patterning with small proximity effect is demonstrated using HIBL using standard processing conditions, establishing its potential as an alternative to EBL for rapid prototyping of beyond CMOS devices.

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Citation

Shi, Xiaoqing, Prewett, Philip, Huq, Ejaz, Bagnall, Darren, Robinson, Alex and Boden, Stuart (2017) Dataset for Helium Ion Beam Lithography on Fullerene Molecular Resists for Sub-10 nm Patterning University of Southampton doi:10.5258/SOTON/404189 [Dataset]

More information

Published date: 2017
Keywords: helium ion bean lithography, helium ion microscope, Fullerene, molecular resist, nanolithography, next-generation lithography
Organisations: Electronics & Computer Science, Nanoelectronics and Nanotechnology
Projects:
Single Nanometer Manufacturing for beyond CMOS devices (SNM)
Funded by: UNSPECIFIED (318804)
1 January 2013 to 31 December 2016

Identifiers

Local EPrints ID: 404189
URI: http://eprints.soton.ac.uk/id/eprint/404189
PURE UUID: aa3d33bc-5db2-4065-85ce-a449952c1d4c
ORCID for Stuart Boden: ORCID iD orcid.org/0000-0002-4232-1828

Catalogue record

Date deposited: 17 Jan 2017 16:47
Last modified: 19 Jul 2017 00:49

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Contributors

Creator: Xiaoqing Shi
Creator: Philip Prewett
Creator: Ejaz Huq
Creator: Darren Bagnall
Creator: Alex Robinson
Creator: Stuart Boden ORCID iD

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