Restorative self-image of rough-line grids: application to coherent EUV Talbot lithography
Restorative self-image of rough-line grids: application to coherent EUV Talbot lithography
Self-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a periodic structure. The self-imaging effect (or Talbot effect) replicates the field intensity at a periodic mask in certain planes, effectively producing in those planes an image of the mask. However, the effect has not been analyzed for a rough-line grid from the point of view of the fidelity of the image. In this paper, we investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the extreme ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the line edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach further for the cases of sub-100-nm pitch grids.
Kim, Hyunsu
39359bf5-7ed4-4524-ba57-f8ce78468b5a
Li, Wei
eb838bb4-2eb6-430d-90ea-b0ef8bf8b1ff
Marconi, Mario
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Brocklesby, William
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Juschkin, Larissa
5c7e1507-20c3-45a7-826a-82f1e31fd146
June 2016
Kim, Hyunsu
39359bf5-7ed4-4524-ba57-f8ce78468b5a
Li, Wei
eb838bb4-2eb6-430d-90ea-b0ef8bf8b1ff
Marconi, Mario
0c6542c0-a239-4830-8ec7-32bee9bfbc09
Brocklesby, William
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Juschkin, Larissa
5c7e1507-20c3-45a7-826a-82f1e31fd146
Kim, Hyunsu, Li, Wei, Marconi, Mario, Brocklesby, William and Juschkin, Larissa
(2016)
Restorative self-image of rough-line grids: application to coherent EUV Talbot lithography.
IEEE Photonics Journal, 8 (3), [2600209].
(doi:10.1109/JPHOT.2016.2553847).
Abstract
Self-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a periodic structure. The self-imaging effect (or Talbot effect) replicates the field intensity at a periodic mask in certain planes, effectively producing in those planes an image of the mask. However, the effect has not been analyzed for a rough-line grid from the point of view of the fidelity of the image. In this paper, we investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the extreme ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the line edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach further for the cases of sub-100-nm pitch grids.
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e-pub ahead of print date: 13 April 2016
Published date: June 2016
Organisations:
Optoelectronics Research Centre
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Local EPrints ID: 406798
URI: http://eprints.soton.ac.uk/id/eprint/406798
ISSN: 1943-0655
PURE UUID: b11a1b07-9c75-44b7-a5fc-a06223b5ee2a
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Date deposited: 22 Mar 2017 02:09
Last modified: 16 Mar 2024 02:39
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Contributors
Author:
Hyunsu Kim
Author:
Wei Li
Author:
Mario Marconi
Author:
Larissa Juschkin
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