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Low-loss micro-resonator filters fabricated in silicon by CMOS-compatible lithographic techniques: design and characterization

Low-loss micro-resonator filters fabricated in silicon by CMOS-compatible lithographic techniques: design and characterization
Low-loss micro-resonator filters fabricated in silicon by CMOS-compatible lithographic techniques: design and characterization
Optical resonators are fundamental building-blocks for the development of Si-photonics-integrated circuits, as tunable on-chip optical filters. In addition to the specific spectral shape, which may vary according to a particular application, extremely low losses from these devices are a crucial requirement. In the current state-of-the-art devices, most low-loss filters have only been demonstrated by exploiting ad hoc lithographic and etching techniques, which are not compatible with the standard CMOS (complementary metal-oxide semiconductor) process-flow available at Si-photonic foundries. In this paper, we describe the design and optimization of optical micro-resonators, based on Si-waveguides with a height lower than the standard ones (i.e., less than 220 nm), prepared on SOI (silicon on insulator) platform, which allow the realization of high-performance optical filters with an insertion loss lower than 1 dB, using only previously validated lithographic etch-depths.
Marchetti, Riccardo
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Vitali, Valerio
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Lacava, Cosimo
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Cristiani, Ilaria
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Giuliani, Guido
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Muffato, Viviane
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Fournier, Maryse
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Abrate, Silvio
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Gaudino, Roberto
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Temporiti, Enrico
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Carroll, Lee
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Minzioni, Paolo
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Marchetti, Riccardo
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Vitali, Valerio
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Lacava, Cosimo
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Cristiani, Ilaria
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Giuliani, Guido
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Muffato, Viviane
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Fournier, Maryse
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Abrate, Silvio
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Gaudino, Roberto
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Temporiti, Enrico
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Carroll, Lee
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Minzioni, Paolo
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Marchetti, Riccardo, Vitali, Valerio, Lacava, Cosimo, Cristiani, Ilaria, Giuliani, Guido, Muffato, Viviane, Fournier, Maryse, Abrate, Silvio, Gaudino, Roberto, Temporiti, Enrico, Carroll, Lee and Minzioni, Paolo (2017) Low-loss micro-resonator filters fabricated in silicon by CMOS-compatible lithographic techniques: design and characterization. Applied Sciences, 7 (2), [174]. (doi:10.3390/app7020174).

Record type: Article

Abstract

Optical resonators are fundamental building-blocks for the development of Si-photonics-integrated circuits, as tunable on-chip optical filters. In addition to the specific spectral shape, which may vary according to a particular application, extremely low losses from these devices are a crucial requirement. In the current state-of-the-art devices, most low-loss filters have only been demonstrated by exploiting ad hoc lithographic and etching techniques, which are not compatible with the standard CMOS (complementary metal-oxide semiconductor) process-flow available at Si-photonic foundries. In this paper, we describe the design and optimization of optical micro-resonators, based on Si-waveguides with a height lower than the standard ones (i.e., less than 220 nm), prepared on SOI (silicon on insulator) platform, which allow the realization of high-performance optical filters with an insertion loss lower than 1 dB, using only previously validated lithographic etch-depths.

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Accepted/In Press date: 7 February 2017
e-pub ahead of print date: 11 February 2017
Published date: 11 February 2017
Organisations: Optoelectronics Research Centre

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Local EPrints ID: 407991
URI: http://eprints.soton.ac.uk/id/eprint/407991
PURE UUID: cfd24a14-e728-42b6-9d2a-5bc89f075c2e
ORCID for Cosimo Lacava: ORCID iD orcid.org/0000-0002-9950-8642

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Date deposited: 06 May 2017 01:04
Last modified: 15 Mar 2024 13:30

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Contributors

Author: Riccardo Marchetti
Author: Valerio Vitali
Author: Cosimo Lacava ORCID iD
Author: Ilaria Cristiani
Author: Guido Giuliani
Author: Viviane Muffato
Author: Maryse Fournier
Author: Silvio Abrate
Author: Roberto Gaudino
Author: Enrico Temporiti
Author: Lee Carroll
Author: Paolo Minzioni

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