Shi, Xiaoqing, Prewett, Philip, Huq, Ejaz, Bagnall, Darren and Boden, Stuart (2016) A quantitative comparison between helium ion and electron beam lithography on PMMA resist. 42nd International Conference on Micro and Nano Engineering, Vienna, Austria. 19 - 23 Sep 2016. 1 pp .
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X.ShiAbstract_MNE2016-Accepted
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Accepted/In Press date: 15 July 2016
Published date: September 2016
Venue - Dates:
42nd International Conference on Micro and Nano Engineering, Vienna, Austria, 2016-09-19 - 2016-09-23
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 408123
URI: http://eprints.soton.ac.uk/id/eprint/408123
PURE UUID: 63bae9dd-dc3c-454c-807e-6090a7145892
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Date deposited: 12 May 2017 04:03
Last modified: 16 Mar 2024 03:42
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Contributors
Author:
Xiaoqing Shi
Author:
Philip Prewett
Author:
Ejaz Huq
Author:
Darren Bagnall
Author:
Stuart Boden
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