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A quantitative comparison between helium ion and electron beam lithography on PMMA resist

A quantitative comparison between helium ion and electron beam lithography on PMMA resist
A quantitative comparison between helium ion and electron beam lithography on PMMA resist
Shi, Xiaoqing
004139e0-0381-40c5-a407-ea9865fd3c7a
Prewett, Philip
6a3a966f-5dd0-43d0-8a51-6a5f78e56b1a
Huq, Ejaz
6ba52b03-395d-4361-96b0-5f0d9d7eb746
Bagnall, Darren
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Boden, Stuart
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Shi, Xiaoqing
004139e0-0381-40c5-a407-ea9865fd3c7a
Prewett, Philip
6a3a966f-5dd0-43d0-8a51-6a5f78e56b1a
Huq, Ejaz
6ba52b03-395d-4361-96b0-5f0d9d7eb746
Bagnall, Darren
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Boden, Stuart
83976b65-e90f-42d1-9a01-fe9cfc571bf8

Shi, Xiaoqing, Prewett, Philip, Huq, Ejaz, Bagnall, Darren and Boden, Stuart (2016) A quantitative comparison between helium ion and electron beam lithography on PMMA resist. 42nd International Conference on Micro and Nano Engineering, Austria. 19 - 23 Sep 2016. 1 pp .

Record type: Conference or Workshop Item (Other)
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X.ShiAbstract_MNE2016-Accepted - Accepted Manuscript
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More information

Accepted/In Press date: 15 July 2016
Published date: September 2016
Venue - Dates: 42nd International Conference on Micro and Nano Engineering, Austria, 2016-09-19 - 2016-09-23
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 408123
URI: https://eprints.soton.ac.uk/id/eprint/408123
PURE UUID: 63bae9dd-dc3c-454c-807e-6090a7145892
ORCID for Stuart Boden: ORCID iD orcid.org/0000-0002-4232-1828

Catalogue record

Date deposited: 12 May 2017 04:03
Last modified: 14 Mar 2019 01:42

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