Reconfigurable phase-change photomask for grayscale photolithography
Reconfigurable phase-change photomask for grayscale photolithography
We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique.
Wang, Q.
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Yuan, G.H.
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Kiang, K.S.
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Sun, K.
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Gholipour, B.
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Rogers, E.T.F.
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Huang, K.
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Ang, S.S.
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Zheludev, N.I.
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Teng, J.H.
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Wang, Q.
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Yuan, G.H.
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Kiang, K.S.
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Sun, K.
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Gholipour, B.
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Rogers, E.T.F.
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Huang, K.
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Ang, S.S.
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Zheludev, N.I.
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Teng, J.H.
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Wang, Q., Yuan, G.H., Kiang, K.S., Sun, K., Gholipour, B., Rogers, E.T.F., Huang, K., Ang, S.S., Zheludev, N.I. and Teng, J.H.
(2017)
Reconfigurable phase-change photomask for grayscale photolithography.
Applied Physics Letters, 110, [201110].
(doi:10.1063/1.4983198).
Abstract
We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique.
Text
Reconfigurable phase-change photomask AAV
- Accepted Manuscript
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Accepted/In Press date: 27 April 2017
e-pub ahead of print date: 18 May 2017
Organisations:
Optoelectronics Research Centre
Identifiers
Local EPrints ID: 408237
URI: http://eprints.soton.ac.uk/id/eprint/408237
ISSN: 0003-6951
PURE UUID: 443aa447-4f53-4be9-8a3b-007c1ff671c7
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Date deposited: 18 May 2017 04:01
Last modified: 15 Jun 2024 01:42
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Contributors
Author:
Q. Wang
Author:
G.H. Yuan
Author:
K.S. Kiang
Author:
B. Gholipour
Author:
E.T.F. Rogers
Author:
K. Huang
Author:
S.S. Ang
Author:
N.I. Zheludev
Author:
J.H. Teng
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