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Reconfigurable phase-change photomask for grayscale photolithography

Reconfigurable phase-change photomask for grayscale photolithography
Reconfigurable phase-change photomask for grayscale photolithography
We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique.
0003-6951
Wang, Q.
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Yuan, G.H.
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Kiang, K.S.
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Sun, K.
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Gholipour, B.
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Rogers, E.T.F.
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Huang, K.
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Ang, S.S.
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Zheludev, N.I.
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Teng, J.H.
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Wang, Q.
a9a64412-49cc-4ab7-9bb6-646551219d66
Yuan, G.H.
d7af6f06-7da9-41ef-b7f9-cfe09e55fcaa
Kiang, K.S.
fdb609c6-75aa-4893-85c8-8e50edfda7fe
Sun, K.
b7c648a3-7be8-4613-9d4d-1bf937fb487b
Gholipour, B.
c17bd62d-9df6-40e6-bc42-65272d97e559
Rogers, E.T.F.
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Huang, K.
825f7447-6d02-48f6-b95a-fa33da71f106
Ang, S.S.
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Zheludev, N.I.
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Teng, J.H.
f47107ab-c320-4326-a8fe-45d9113f257a

Wang, Q., Yuan, G.H., Kiang, K.S., Sun, K., Gholipour, B., Rogers, E.T.F., Huang, K., Ang, S.S., Zheludev, N.I. and Teng, J.H. (2017) Reconfigurable phase-change photomask for grayscale photolithography. Applied Physics Letters, 110, [201110]. (doi:10.1063/1.4983198).

Record type: Article

Abstract

We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique.

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Reconfigurable phase-change photomask AAV - Accepted Manuscript
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Accepted/In Press date: 27 April 2017
e-pub ahead of print date: 18 May 2017
Organisations: Optoelectronics Research Centre

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Local EPrints ID: 408237
URI: http://eprints.soton.ac.uk/id/eprint/408237
ISSN: 0003-6951
PURE UUID: 443aa447-4f53-4be9-8a3b-007c1ff671c7
ORCID for K.S. Kiang: ORCID iD orcid.org/0000-0002-7326-909X
ORCID for K. Huang: ORCID iD orcid.org/0000-0003-3471-2463
ORCID for N.I. Zheludev: ORCID iD orcid.org/0000-0002-1013-6636

Catalogue record

Date deposited: 18 May 2017 04:01
Last modified: 22 Nov 2021 02:52

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Contributors

Author: Q. Wang
Author: G.H. Yuan
Author: K.S. Kiang ORCID iD
Author: K. Sun
Author: B. Gholipour
Author: E.T.F. Rogers
Author: K. Huang ORCID iD
Author: S.S. Ang
Author: N.I. Zheludev ORCID iD
Author: J.H. Teng

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