Boden, Stuart and Shi, Xiaoqing (2017) Helium ion beam lithography for sub-10nm pattern definition. SPIE Newsroom. (doi:10.1117/2.1201702.006839).
Record type:
Article
Abstract
An emerging lithographic technique offers a promising alternative to electron beam lithography for fabricating new semiconductor devices with both traditional and non-traditional resists.
More information
Accepted/In Press date: 9 February 2017
e-pub ahead of print date: 15 May 2017
Keywords:
helium ion beam lithography, Helium ion microscope, nanolithography
Organisations:
Electronics & Computer Science, Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 410526
URI: http://eprints.soton.ac.uk/id/eprint/410526
PURE UUID: 5204c21c-6077-4118-a09e-3ff90da2bc85
Catalogue record
Date deposited: 09 Jun 2017 09:02
Last modified: 16 Mar 2024 03:42
Export record
Altmetrics
Contributors
Author:
Stuart Boden
Author:
Xiaoqing Shi
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.