Comparison of Etches for Top-down Fabrication of Polycrystalline Silicon Nanowires
Comparison of Etches for Top-down Fabrication of Polycrystalline Silicon Nanowires
Sun, Kai
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Hakim, MMA
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Zeimpekis, Ioannis
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Gunn, Robert
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Ashburn, Peter
68cef6b7-205b-47aa-9efb-f1f09f5c1038
1 September 2012
Sun, Kai
b7c648a3-7be8-4613-9d4d-1bf937fb487b
Hakim, MMA
2c4da711-fc01-499f-958a-d453e1e1d720
Zeimpekis, Ioannis
a2c354ec-3891-497c-adac-89b3a5d96af0
Gunn, Robert
6492aa2c-1754-405e-ac62-0eedf0ed1757
Ashburn, Peter
68cef6b7-205b-47aa-9efb-f1f09f5c1038
Sun, Kai, Hakim, MMA, Zeimpekis, Ioannis, Gunn, Robert and Ashburn, Peter
(2012)
Comparison of Etches for Top-down Fabrication of Polycrystalline Silicon Nanowires.
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Published date: 1 September 2012
Organisations:
Optoelectronics Research Centre, Electronics & Computer Science, Nanoelectronics and Nanotechnology
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Local EPrints ID: 410532
URI: http://eprints.soton.ac.uk/id/eprint/410532
PURE UUID: 05428180-f599-4069-8544-add6b4b66129
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Date deposited: 09 Jun 2017 09:02
Last modified: 21 Sep 2024 01:46
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Contributors
Author:
MMA Hakim
Author:
Robert Gunn
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