Improved surface quality of anisotropically etched silicon {111} planes for mm-scale optics
Improved surface quality of anisotropically etched silicon {111} planes for mm-scale optics
1032-1042
Cotter, J.P.
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Zeimpekis, Ioannis
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Kraft, Michael
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Hinds, E.A.
a3f6858d-f3fc-460f-84d1-193257a88aac
1 October 2013
Cotter, J.P.
fb2b07a1-7e9b-4cbd-ba91-cc7033e85432
Zeimpekis, Ioannis
a2c354ec-3891-497c-adac-89b3a5d96af0
Kraft, Michael
c2ff2439-b909-4af3-824d-9d7c0d14dc3e
Hinds, E.A.
a3f6858d-f3fc-460f-84d1-193257a88aac
Cotter, J.P., Zeimpekis, Ioannis, Kraft, Michael and Hinds, E.A.
(2013)
Improved surface quality of anisotropically etched silicon {111} planes for mm-scale optics.
Microelectronic Engineering, , [5].
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More information
Published date: 1 October 2013
Organisations:
Optoelectronics Research Centre
Identifiers
Local EPrints ID: 411464
URI: http://eprints.soton.ac.uk/id/eprint/411464
ISSN: 0167-9317
PURE UUID: 34bf5c46-957e-4929-860e-6a842cf67a5a
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Date deposited: 20 Jun 2017 16:31
Last modified: 21 Sep 2024 01:46
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Contributors
Author:
J.P. Cotter
Author:
Michael Kraft
Author:
E.A. Hinds
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