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Improved surface quality of anisotropically etched silicon {111} planes for mm-scale optics

Improved surface quality of anisotropically etched silicon {111} planes for mm-scale optics
Improved surface quality of anisotropically etched silicon {111} planes for mm-scale optics
0167-9317
1032-1042
Cotter, J.P.
fb2b07a1-7e9b-4cbd-ba91-cc7033e85432
Zeimpekis, Ioannis
a2c354ec-3891-497c-adac-89b3a5d96af0
Kraft, Michael
c2ff2439-b909-4af3-824d-9d7c0d14dc3e
Hinds, E.A.
a3f6858d-f3fc-460f-84d1-193257a88aac
Cotter, J.P.
fb2b07a1-7e9b-4cbd-ba91-cc7033e85432
Zeimpekis, Ioannis
a2c354ec-3891-497c-adac-89b3a5d96af0
Kraft, Michael
c2ff2439-b909-4af3-824d-9d7c0d14dc3e
Hinds, E.A.
a3f6858d-f3fc-460f-84d1-193257a88aac

Cotter, J.P., Zeimpekis, Ioannis, Kraft, Michael and Hinds, E.A. (2013) Improved surface quality of anisotropically etched silicon {111} planes for mm-scale optics. Microelectronic Engineering, 1032-1042, [5].

Record type: Article

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More information

Published date: 1 October 2013
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 411464
URI: http://eprints.soton.ac.uk/id/eprint/411464
ISSN: 0167-9317
PURE UUID: 34bf5c46-957e-4929-860e-6a842cf67a5a
ORCID for Ioannis Zeimpekis: ORCID iD orcid.org/0000-0002-7455-1599

Catalogue record

Date deposited: 20 Jun 2017 16:31
Last modified: 20 Jun 2022 01:40

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Contributors

Author: J.P. Cotter
Author: Michael Kraft
Author: E.A. Hinds

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