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Supercritical fluid electrodeposition, structural and electrical characterisation of tellurium nanowires

Supercritical fluid electrodeposition, structural and electrical characterisation of tellurium nanowires
Supercritical fluid electrodeposition, structural and electrical characterisation of tellurium nanowires
Supercritical fluid electrodeposition (SCFED) was employed for rapid deposition (2.5 μm min−1) of tellurium nanowires (TeNW) of nominal size range 13 nm to 55 nm diameter and tens of micrometers in length. Anodic aluminium oxide (AAO) membranes were used as hard templates for the electrodeposition by evaporation of platinum or gold onto one face to form the electrode. TeNWs were characterised both in situ and after removal of the AAO template by XRD, Raman spectroscopy and electron microscopy. The nanowires were crystalline with a strong preferred orientation in all cases. The typical 〈001〉 growth direction was always observed for samples produced using platinum coated membranes; however for the gold coated membranes, a chemical reaction between the tellurium(IV) precursor and the gold led to atypical 〈110〉 growth. Transistor devices were fabricated from individual TeNWs and their electrical properties characterised.
2046-2069
40720-40726
Bartlett, Philip N.
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Cook, David
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Hasan, Mahboba, Mohammed
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Hector, Andrew L.
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Marks, Samuel
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Naik, Jay P.
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Reid, Gillian
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Sloan, Jeremy
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Smith, David C.
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Spencer, Joe
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Webber, Zondy
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Bartlett, Philip N.
d99446db-a59d-4f89-96eb-f64b5d8bb075
Cook, David
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Hasan, Mahboba, Mohammed
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Hector, Andrew L.
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Marks, Samuel
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Naik, Jay P.
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Reid, Gillian
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Sloan, Jeremy
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Smith, David C.
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Spencer, Joe
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Webber, Zondy
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Bartlett, Philip N., Cook, David, Hasan, Mahboba, Mohammed, Hector, Andrew L., Marks, Samuel, Naik, Jay P., Reid, Gillian, Sloan, Jeremy, Smith, David C., Spencer, Joe and Webber, Zondy (2017) Supercritical fluid electrodeposition, structural and electrical characterisation of tellurium nanowires. RSC Advances, 7 (65), 40720-40726. (doi:10.1039/c7ra07092f).

Record type: Article

Abstract

Supercritical fluid electrodeposition (SCFED) was employed for rapid deposition (2.5 μm min−1) of tellurium nanowires (TeNW) of nominal size range 13 nm to 55 nm diameter and tens of micrometers in length. Anodic aluminium oxide (AAO) membranes were used as hard templates for the electrodeposition by evaporation of platinum or gold onto one face to form the electrode. TeNWs were characterised both in situ and after removal of the AAO template by XRD, Raman spectroscopy and electron microscopy. The nanowires were crystalline with a strong preferred orientation in all cases. The typical 〈001〉 growth direction was always observed for samples produced using platinum coated membranes; however for the gold coated membranes, a chemical reaction between the tellurium(IV) precursor and the gold led to atypical 〈110〉 growth. Transistor devices were fabricated from individual TeNWs and their electrical properties characterised.

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Accepted/In Press date: 15 August 2017
e-pub ahead of print date: 21 August 2017
Published date: 2017

Identifiers

Local EPrints ID: 413442
URI: http://eprints.soton.ac.uk/id/eprint/413442
ISSN: 2046-2069
PURE UUID: 83c7c085-67fe-453d-81d6-4f16db416bef
ORCID for Philip N. Bartlett: ORCID iD orcid.org/0000-0002-7300-6900
ORCID for Andrew L. Hector: ORCID iD orcid.org/0000-0002-9964-2163
ORCID for Gillian Reid: ORCID iD orcid.org/0000-0001-5349-3468

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Date deposited: 24 Aug 2017 16:30
Last modified: 16 Mar 2024 02:53

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Contributors

Author: David Cook
Author: Mahboba, Mohammed Hasan
Author: Samuel Marks
Author: Jay P. Naik
Author: Gillian Reid ORCID iD
Author: Jeremy Sloan
Author: David C. Smith
Author: Joe Spencer
Author: Zondy Webber

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