Use of the orthogonal projection approach (OPA) to monitor batch processes
Use of the orthogonal projection approach (OPA) to monitor batch processes
The orthogonal projection approach (OPA) and multivariate curve resolution (MCR) are presented as a way to monitor batch processes using spectroscopic data. Curve resolution allows one to look within a batch and predict on-line real concentration profiles of the different species appearing during reactions. Taking into account the variations of the process by using an augmented matrix of complete batches, the procedure explained here calculates some prediction coefficients that can afterwards be applied for a new batch.
ALS, Alternating least squares, Batch, MCR, Multivariate curve resolution, Near infrared, NIR, On-line monitoring, OPA, Orthogonal projection approach, Process control
80-87
Gourvénec, S.
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Lamotte, C.
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Pestiaux, P.
4217fb63-5864-429b-9d32-395d2b03583c
Massart, D. L.
e45e44fe-05dd-4936-89f0-85fe53999ce5
January 2003
Gourvénec, S.
6ff91ad8-1a91-42fe-a3f4-1b5d6f5ce0b8
Lamotte, C.
d1b59c3f-7679-401a-8d11-d22fd443c4d9
Pestiaux, P.
4217fb63-5864-429b-9d32-395d2b03583c
Massart, D. L.
e45e44fe-05dd-4936-89f0-85fe53999ce5
Gourvénec, S., Lamotte, C., Pestiaux, P. and Massart, D. L.
(2003)
Use of the orthogonal projection approach (OPA) to monitor batch processes.
Applied Spectroscopy, 57 (1), .
(doi:10.1366/000370203321165241).
Abstract
The orthogonal projection approach (OPA) and multivariate curve resolution (MCR) are presented as a way to monitor batch processes using spectroscopic data. Curve resolution allows one to look within a batch and predict on-line real concentration profiles of the different species appearing during reactions. Taking into account the variations of the process by using an augmented matrix of complete batches, the procedure explained here calculates some prediction coefficients that can afterwards be applied for a new batch.
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Published date: January 2003
Keywords:
ALS, Alternating least squares, Batch, MCR, Multivariate curve resolution, Near infrared, NIR, On-line monitoring, OPA, Orthogonal projection approach, Process control
Identifiers
Local EPrints ID: 414624
URI: http://eprints.soton.ac.uk/id/eprint/414624
ISSN: 0003-7028
PURE UUID: 52359ca1-5429-483c-a9af-f2b2f8ea661a
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Date deposited: 05 Oct 2017 16:30
Last modified: 16 Mar 2024 04:31
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Contributors
Author:
C. Lamotte
Author:
P. Pestiaux
Author:
D. L. Massart
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