Chemical modification and patterning of Si(100) using interference photolithography
Chemical modification and patterning of Si(100) using interference photolithography
Yin, H.B.
80f33a1f-d886-4f09-adab-bc65e9125c29
Brown, T.
65b220ab-5839-4e03-b923-97694339baaf
Mailis, Sakellaris
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Wilkinson, James
73483cf3-d9f2-4688-9b09-1c84257884ca
Melvin, T.
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f
2003
Yin, H.B.
80f33a1f-d886-4f09-adab-bc65e9125c29
Brown, T.
65b220ab-5839-4e03-b923-97694339baaf
Mailis, Sakellaris
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Wilkinson, James
73483cf3-d9f2-4688-9b09-1c84257884ca
Melvin, T.
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f
Yin, H.B., Brown, T., Mailis, Sakellaris, Wilkinson, James and Melvin, T.
(2003)
Chemical modification and patterning of Si(100) using interference photolithography.
MNE 2003: Micro and Nano Engineering, Cambridge, UK.
21 - 24 Sep 2003.
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Conference or Workshop Item
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Published date: 2003
Venue - Dates:
MNE 2003: Micro and Nano Engineering, Cambridge, UK, 2003-09-21 - 2003-09-24
Identifiers
Local EPrints ID: 41558
URI: http://eprints.soton.ac.uk/id/eprint/41558
PURE UUID: f28dedb1-5e6c-49ac-a92b-cf9dc7cbd2cf
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Date deposited: 02 Oct 2006
Last modified: 12 Dec 2021 03:03
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Contributors
Author:
H.B. Yin
Author:
T. Brown
Author:
Sakellaris Mailis
Author:
T. Melvin
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