New deep glass etching technology
New deep glass etching technology
A new masking technology useful for wet etching of glass, to a depth of more than 300µm, is reported; multilayers of metal in combination with thick SPRT220 photoresist, are used. This new method was successfully developed for fabricating a 200µm thick diaphragm for a micro peristaltic pump. Various mask materials, which can be patterned by standard photolithography and metal etching processes, were investigated. The main advantage of this newly developed method was the application of hydrofluoric acid etching to create deep cavities with a uniform membrane without pinholes, and to minimize lateral undercutting of the glass.
Bu, M.
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Melvin, T.
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f
Ensell, G.
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Wilkinson, James
73483cf3-d9f2-4688-9b09-1c84257884ca
Evans, A.G.R.
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2003
Bu, M.
62faacb5-690b-45af-8ee9-0c9378b48abf
Melvin, T.
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f
Ensell, G.
48fe0996-1c6b-4816-8bd0-0a3234d36ae8
Wilkinson, James
73483cf3-d9f2-4688-9b09-1c84257884ca
Evans, A.G.R.
082f720d-3830-46d7-ba87-b058af733bc3
Bu, M., Melvin, T., Ensell, G., Wilkinson, James and Evans, A.G.R.
(2003)
New deep glass etching technology.
Eurosensors XVII, , Guimarães, Portugal.
21 - 24 Sep 2003.
4 pp
.
Record type:
Conference or Workshop Item
(Paper)
Abstract
A new masking technology useful for wet etching of glass, to a depth of more than 300µm, is reported; multilayers of metal in combination with thick SPRT220 photoresist, are used. This new method was successfully developed for fabricating a 200µm thick diaphragm for a micro peristaltic pump. Various mask materials, which can be patterned by standard photolithography and metal etching processes, were investigated. The main advantage of this newly developed method was the application of hydrofluoric acid etching to create deep cavities with a uniform membrane without pinholes, and to minimize lateral undercutting of the glass.
More information
Published date: 2003
Venue - Dates:
Eurosensors XVII, , Guimarães, Portugal, 2003-09-21 - 2003-09-24
Identifiers
Local EPrints ID: 41595
URI: http://eprints.soton.ac.uk/id/eprint/41595
PURE UUID: 3311aa6c-6271-4ca0-a737-1601fbf9b3e5
Catalogue record
Date deposited: 05 Oct 2006
Last modified: 16 Mar 2024 02:33
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Contributors
Author:
M. Bu
Author:
T. Melvin
Author:
G. Ensell
Author:
A.G.R. Evans
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