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Direct UV writing of channel waveguides and Bragg grating structures

Direct UV writing of channel waveguides and Bragg grating structures
Direct UV writing of channel waveguides and Bragg grating structures
Direct UV writing is a dynamic planar lightwave circuit fabrication technique offering great potential as a means of rapid prototyping and small/medium batch fabrication. The technique is based on the refractive index increase of photosensitive glasses through exposure to ultraviolet light. In this case, a beam is tightly focused to create a writing spot in the order of microns and is translated relative to the sample. It is this translation over a 2-d plane that defines the channel waveguide structures; there is no need for a photolithographic mask or subsequent processing. This process has previously been shown to be a versatile system producing good quality, low loss waveguides compatible with existing silica based telecom fibres.
Emmerson, G.D.
89517051-daed-4f8e-aca6-f686d8c54e7c
Gawith, C.B.E.
926665c0-84c7-4a1d-ae19-ee6d7d14c43e
Williams, R.B.
1d172577-abdb-4589-8ded-153cf6732c20
Smith, P.G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6
Emmerson, G.D.
89517051-daed-4f8e-aca6-f686d8c54e7c
Gawith, C.B.E.
926665c0-84c7-4a1d-ae19-ee6d7d14c43e
Williams, R.B.
1d172577-abdb-4589-8ded-153cf6732c20
Smith, P.G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6

Emmerson, G.D., Gawith, C.B.E., Williams, R.B. and Smith, P.G.R. (2003) Direct UV writing of channel waveguides and Bragg grating structures. Rank Prize Funds Minisymposium: Passive Optical Components. 16 - 19 Jun 2003. 1 pp .

Record type: Conference or Workshop Item (Paper)

Abstract

Direct UV writing is a dynamic planar lightwave circuit fabrication technique offering great potential as a means of rapid prototyping and small/medium batch fabrication. The technique is based on the refractive index increase of photosensitive glasses through exposure to ultraviolet light. In this case, a beam is tightly focused to create a writing spot in the order of microns and is translated relative to the sample. It is this translation over a 2-d plane that defines the channel waveguide structures; there is no need for a photolithographic mask or subsequent processing. This process has previously been shown to be a versatile system producing good quality, low loss waveguides compatible with existing silica based telecom fibres.

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More information

Published date: 2003
Additional Information: Winner of best presentation award
Venue - Dates: Rank Prize Funds Minisymposium: Passive Optical Components, 2003-06-16 - 2003-06-19

Identifiers

Local EPrints ID: 41598
URI: https://eprints.soton.ac.uk/id/eprint/41598
PURE UUID: f2c900fa-64ce-462e-b814-6072c3fd1b0d
ORCID for C.B.E. Gawith: ORCID iD orcid.org/0000-0002-3502-3558

Catalogue record

Date deposited: 05 Oct 2006
Last modified: 06 Jun 2018 12:52

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Contributors

Author: G.D. Emmerson
Author: C.B.E. Gawith ORCID iD
Author: R.B. Williams
Author: P.G.R. Smith

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