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Enhancement of bulk second-harmonic generation from silicon nitride films by material composition

Enhancement of bulk second-harmonic generation from silicon nitride films by material composition
Enhancement of bulk second-harmonic generation from silicon nitride films by material composition
We present a comprehensive tensorial characterization of second-harmonic generation from silicon nitride films with varying composition. The samples were fabricated using plasma-enhanced chemical vapor deposition, and the material composition was varied by the reactive gas mixture in the process. We found a six-fold enhancement between the lowest and highest second-order susceptibility, with the highest value of approximately 5 pm/V from the most silicon-rich sample. Moreover, the optical losses were found to be sufficiently small (below 6 dB/cm) for applications. The tensorial results show that all samples retain in-plane isotropy independent of silicon content, highlighting the controllability of the fabrication process.
0146-9592
5030-5033
Koskinen, K.
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Czaplicki, R.
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Slablab, A.
5a74f359-4d8b-4ca7-8b97-d4a38caf9652
Ning, T.
7d18b497-a8c9-4e15-b8f1-d30a1cd58c4b
Hermans, A.
33af2568-5db8-42dd-8b9d-14e95b366804
Kuyken, B.
5380929a-28f5-4ece-b980-606d10064a5d
Mittal, V.
fd5ee9dd-7770-416f-8f47-50ca158b39b0
Murugan, G.S.
a867686e-0535-46cc-ad85-c2342086b25b
Niemi, T.
33fc3014-ef3a-4db6-bf57-cf25d1259e00
Baets, R.
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Kauranen, M.
b8de7feb-4720-40bd-8cd8-db0db8792742
Koskinen, K.
969d1840-717a-43d5-a9f3-26aa2e2fc829
Czaplicki, R.
0c3126f1-4709-41c9-b084-0b0ad42a22c4
Slablab, A.
5a74f359-4d8b-4ca7-8b97-d4a38caf9652
Ning, T.
7d18b497-a8c9-4e15-b8f1-d30a1cd58c4b
Hermans, A.
33af2568-5db8-42dd-8b9d-14e95b366804
Kuyken, B.
5380929a-28f5-4ece-b980-606d10064a5d
Mittal, V.
fd5ee9dd-7770-416f-8f47-50ca158b39b0
Murugan, G.S.
a867686e-0535-46cc-ad85-c2342086b25b
Niemi, T.
33fc3014-ef3a-4db6-bf57-cf25d1259e00
Baets, R.
1ff88d17-2b5a-4db9-b955-08a061d8b208
Kauranen, M.
b8de7feb-4720-40bd-8cd8-db0db8792742

Koskinen, K., Czaplicki, R., Slablab, A., Ning, T., Hermans, A., Kuyken, B., Mittal, V., Murugan, G.S., Niemi, T., Baets, R. and Kauranen, M. (2017) Enhancement of bulk second-harmonic generation from silicon nitride films by material composition. Optics Letters, 42 (23), 5030-5033. (doi:10.1364/OL.42.005030).

Record type: Article

Abstract

We present a comprehensive tensorial characterization of second-harmonic generation from silicon nitride films with varying composition. The samples were fabricated using plasma-enhanced chemical vapor deposition, and the material composition was varied by the reactive gas mixture in the process. We found a six-fold enhancement between the lowest and highest second-order susceptibility, with the highest value of approximately 5 pm/V from the most silicon-rich sample. Moreover, the optical losses were found to be sufficiently small (below 6 dB/cm) for applications. The tensorial results show that all samples retain in-plane isotropy independent of silicon content, highlighting the controllability of the fabrication process.

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Enhancement of bulk second-harmonic generation from silicon nitride films by material composition - Accepted Manuscript
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Accepted/In Press date: 5 November 2017
e-pub ahead of print date: 1 December 2017

Identifiers

Local EPrints ID: 416175
URI: http://eprints.soton.ac.uk/id/eprint/416175
ISSN: 0146-9592
PURE UUID: c9dd5290-1f7a-4abf-8cd3-c36411f7f78a
ORCID for V. Mittal: ORCID iD orcid.org/0000-0003-4836-5327
ORCID for G.S. Murugan: ORCID iD orcid.org/0000-0002-2733-3273

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Date deposited: 06 Dec 2017 17:30
Last modified: 17 Dec 2019 01:46

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