Anisotropic nanostructures directly written by fs pulses in wide-bandgap materials

Abstract

The use of lasers to directly pattern optoelectronic devices primarily utilizes direct irradiation by UV light. We present here an alternative route using multi-photon absorption within a spherical focus in 3D space, thus allowing complex embedded structures to be directly written. In wide-bandgap materials such as chalcogenide, fluoride and silica glasses, our observations suggest free electrons are produced within the focus of a high-power infrared ultrashort pulse. The anisotropic interaction of this plasma with the incident pulse produces micron-sized DBR gratings of a 150nm pitch. An amplified Ti:S laser with 250kHz repetition rate, 150fs pulse duration, and wavelength tuned from 800-850nml is used to write embedded diffraction gratings and arrays of dots. The laser beam is focussed with a 50x objective into transparent polished samples, with pulse energies ranging from 0.1-1.1pJ (Fig.la). During the writing process broadband sub-bandgap UV light is emitted from a micron-sized spot at the sample focus. The written structures are permanent, typically with large refractive index changes on the order of Delta.n = +0.01 depending on the material.

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