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Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films

Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films
Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films
In this paper we report on a novel chemical vapour deposition approach to the formation and control of composition of mixed anion materials, as applied to titanium oxynitride thin films. The method used is the aerosol assisted chemical vapour deposition (AACVD) of a mixture of single source precursors. To explore the titanium-oxygen-nitrogen system the single source precursors selected were tetrakis(dimethylamido) titanium and titanium tetraisopropoxide which individually are precursors to thin films of titanium nitride and titanium dioxide respectively. However, by combining these precursors in specific ratios in a series of AACVD reactions at 400 °C, we are able to deposit thin films of titanium oxynitride with three different structure types and a wide range of compositions. Using this precursor system we can observe films of nitrogen doped anatase, with 25% anion doping of nitrogen; a new composition of pseudobrookite titanium oxynitride with a composition of Ti3O3.5N1.5, identified as being a UV photocatalyst; and rock-salt titanium oxynitride in the range TiO0.41N0.59 to TiO0.05N0.95. The films were characterised using GIXRD, WDX and UV-vis spectroscopy, and in the case of the pseudobrookite films, assessed for photocatalytic activity. This work shows that a so-called dual single-source CVD approach is an effective method for the deposition of ternary mixed anion ceramic films through simple control of the ratio of the precursors, while keeping all other experimental parameters constant.
0300-9246
Rees, Kelly
6bafb134-8750-4feb-873f-1767dd388e29
Lorusso, Emanuela
8b66e7da-1ab3-4d58-b4b3-103052069ab9
Cosham, Samuel
a2dd18d3-e232-44b6-baa0-3ba0e2aba2be
Kulak, Alexander N.
7dc57b4f-aae0-42a4-ae15-fd50ab6521c2
Hyett, Geoffrey
4f292fc9-2198-4b18-99b9-3c74e7dfed8d
Rees, Kelly
6bafb134-8750-4feb-873f-1767dd388e29
Lorusso, Emanuela
8b66e7da-1ab3-4d58-b4b3-103052069ab9
Cosham, Samuel
a2dd18d3-e232-44b6-baa0-3ba0e2aba2be
Kulak, Alexander N.
7dc57b4f-aae0-42a4-ae15-fd50ab6521c2
Hyett, Geoffrey
4f292fc9-2198-4b18-99b9-3c74e7dfed8d

Rees, Kelly, Lorusso, Emanuela, Cosham, Samuel, Kulak, Alexander N. and Hyett, Geoffrey (2018) Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films. Dalton Transactions. (doi:10.1039/c7dt04694d).

Record type: Article

Abstract

In this paper we report on a novel chemical vapour deposition approach to the formation and control of composition of mixed anion materials, as applied to titanium oxynitride thin films. The method used is the aerosol assisted chemical vapour deposition (AACVD) of a mixture of single source precursors. To explore the titanium-oxygen-nitrogen system the single source precursors selected were tetrakis(dimethylamido) titanium and titanium tetraisopropoxide which individually are precursors to thin films of titanium nitride and titanium dioxide respectively. However, by combining these precursors in specific ratios in a series of AACVD reactions at 400 °C, we are able to deposit thin films of titanium oxynitride with three different structure types and a wide range of compositions. Using this precursor system we can observe films of nitrogen doped anatase, with 25% anion doping of nitrogen; a new composition of pseudobrookite titanium oxynitride with a composition of Ti3O3.5N1.5, identified as being a UV photocatalyst; and rock-salt titanium oxynitride in the range TiO0.41N0.59 to TiO0.05N0.95. The films were characterised using GIXRD, WDX and UV-vis spectroscopy, and in the case of the pseudobrookite films, assessed for photocatalytic activity. This work shows that a so-called dual single-source CVD approach is an effective method for the deposition of ternary mixed anion ceramic films through simple control of the ratio of the precursors, while keeping all other experimental parameters constant.

Text AACVD_Titanium_oxynitrides_Hyett_V3 - Accepted Manuscript
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Accepted/In Press date: 5 February 2018
e-pub ahead of print date: 5 February 2018

Identifiers

Local EPrints ID: 417616
URI: https://eprints.soton.ac.uk/id/eprint/417616
ISSN: 0300-9246
PURE UUID: 9ba8f46c-3191-4741-920e-628ac713ff51
ORCID for Geoffrey Hyett: ORCID iD orcid.org/0000-0001-9302-9723

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Date deposited: 07 Feb 2018 17:30
Last modified: 14 Jul 2018 00:30

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Contributors

Author: Kelly Rees
Author: Emanuela Lorusso
Author: Samuel Cosham
Author: Alexander N. Kulak
Author: Geoffrey Hyett ORCID iD

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