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Greyscale photolithography with phase change material photomasks

Greyscale photolithography with phase change material photomasks
Greyscale photolithography with phase change material photomasks
Zheludev, Nikolai
32fb6af7-97e4-4d11-bca6-805745e40cc6
Wang, Qian
861a2596-d822-41fd-bd7b-4fcdc2f81d2e
Yuan, Guanghui
31e40202-9b7d-4ca1-be09-3c2736e623d7
Gholipour, Behrad
c17bd62d-9df6-40e6-bc42-65272d97e559
Rogers, Edward T.F.
b92cc8ab-0d91-4b2e-b5c7-8a2f490a36a2
Huang, Kun
85ec42dd-c528-4a3c-bc26-e8fb75989962
Ang, S.S.
b840b858-a06d-43d8-8e3e-3de140a496cb
Ten, Jinghua
5e7bd59b-abb1-4acd-a796-8c9d2aa54f43
Zheludev, Nikolai
32fb6af7-97e4-4d11-bca6-805745e40cc6
Wang, Qian
861a2596-d822-41fd-bd7b-4fcdc2f81d2e
Yuan, Guanghui
31e40202-9b7d-4ca1-be09-3c2736e623d7
Gholipour, Behrad
c17bd62d-9df6-40e6-bc42-65272d97e559
Rogers, Edward T.F.
b92cc8ab-0d91-4b2e-b5c7-8a2f490a36a2
Huang, Kun
85ec42dd-c528-4a3c-bc26-e8fb75989962
Ang, S.S.
b840b858-a06d-43d8-8e3e-3de140a496cb
Ten, Jinghua
5e7bd59b-abb1-4acd-a796-8c9d2aa54f43

Zheludev, Nikolai, Wang, Qian, Yuan, Guanghui, Gholipour, Behrad, Rogers, Edward T.F., Huang, Kun, Ang, S.S. and Ten, Jinghua (2017) Greyscale photolithography with phase change material photomasks. CLEO-PR OECC & PGC 2017, Singapore. 31 Jul - 04 Aug 2017.

Record type: Conference or Workshop Item (Poster)

This record has no associated files available for download.

More information

Published date: 31 July 2017
Venue - Dates: CLEO-PR OECC & PGC 2017, Singapore, 2017-07-31 - 2017-08-04

Identifiers

Local EPrints ID: 417674
URI: http://eprints.soton.ac.uk/id/eprint/417674
PURE UUID: 157d00d3-2664-4833-a423-a85b17836f1c
ORCID for Nikolai Zheludev: ORCID iD orcid.org/0000-0002-1013-6636

Catalogue record

Date deposited: 09 Feb 2018 17:30
Last modified: 10 Nov 2021 02:42

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Contributors

Author: Qian Wang
Author: Guanghui Yuan
Author: Behrad Gholipour
Author: Edward T.F. Rogers
Author: Kun Huang
Author: S.S. Ang
Author: Jinghua Ten

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