Hot Wire Chemical Vapour Deposition (HWCVD) for silicon photonics: a new industrial application
Hot Wire Chemical Vapour Deposition (HWCVD) for silicon photonics: a new industrial application
Tarazona, Antulio
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Oo, Swe
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Domínguez Bucio, Thalía
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Pg Hj Petra, Dk Rafidah
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Khokhar, Ali
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Mittal, Vinita
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Gardes, Frederic
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Reed, Graham
ca08dd60-c072-4d7d-b254-75714d570139
Chong, Harold
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3 September 2018
Tarazona, Antulio
c6ae87c5-c746-4f89-9ff0-9e7b6874e94f
Oo, Swe
6495f6da-8f17-4484-98fb-6151b4efbd9a
Domínguez Bucio, Thalía
83b57799-c566-473c-9b53-92e9c50b4287
Pg Hj Petra, Dk Rafidah
578011d0-6b70-412e-abb7-d04acce3ac4a
Khokhar, Ali
2eedd1cc-8ac5-4f8e-be25-930bd3eae396
Mittal, Vinita
fd5ee9dd-7770-416f-8f47-50ca158b39b0
Gardes, Frederic
7a49fc6d-dade-4099-b016-c60737cb5bb2
Reed, Graham
ca08dd60-c072-4d7d-b254-75714d570139
Chong, Harold
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Tarazona, Antulio, Oo, Swe, Domínguez Bucio, Thalía, Pg Hj Petra, Dk Rafidah, Khokhar, Ali, Mittal, Vinita, Gardes, Frederic, Reed, Graham and Chong, Harold
(2018)
Hot Wire Chemical Vapour Deposition (HWCVD) for silicon photonics: a new industrial application.
10th Hot Wire (Cat) Chemical Vapour Deposition Conference, Kitakyushu International Conference Center, Kitakyushu, Japan.
03 - 06 Sep 2018.
Record type:
Conference or Workshop Item
(Paper)
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Published date: 3 September 2018
Venue - Dates:
10th Hot Wire (Cat) Chemical Vapour Deposition Conference, Kitakyushu International Conference Center, Kitakyushu, Japan, 2018-09-03 - 2018-09-06
Identifiers
Local EPrints ID: 423203
URI: http://eprints.soton.ac.uk/id/eprint/423203
PURE UUID: 67240298-3102-4454-8a48-45df30140a26
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Date deposited: 19 Sep 2018 16:30
Last modified: 23 Feb 2023 03:15
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Contributors
Author:
Antulio Tarazona
Author:
Swe Oo
Author:
Thalía Domínguez Bucio
Author:
Dk Rafidah Pg Hj Petra
Author:
Ali Khokhar
Author:
Vinita Mittal
Author:
Frederic Gardes
Author:
Graham Reed
Author:
Harold Chong
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