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Role of electrochemical process parameters on the electrodeposition of silicon from 1-butyl-1-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide ionic liquid

Role of electrochemical process parameters on the electrodeposition of silicon from 1-butyl-1-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide ionic liquid
Role of electrochemical process parameters on the electrodeposition of silicon from 1-butyl-1-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide ionic liquid
The electrodeposition from Room Temperature Ionic Liquids (RTILs) has recently emerged as a low cost technique for the growth of group IV thin films or nanostructures giving some promising alternative to classical physical vapour or chemical vapour deposition techniques. As a relatively new field of research, only few studies exist describing the growth mechanism of electrodeposition from RTILs, especially for Si films. In the present work, Cyclic Voltammetry (CV), Electrochemical Quartz Crystal Microbalance (EQCM) and potentiostatic electrodeposition techniques have been used to study the role of the applied potential, the concentration of electroactive species, the temperature, and the use of organic additive on the electrodeposition of Si from 1-butyl-1-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide ionic liquid. The demonstrated investigation of the influence of these parameters on the purity and morphological features gives a better control over the growth of Si thin films and optimizes the technique to grow Si with structural properties suitable for specific applications.
Electrodeposition, Growth parameters, Ionic liquid, Silicon
0013-4686
166-174
Thomas, Shibin
f9dd0751-582b-4c35-9725-36fbe08bbda8
Kowalski, Damian
b8ff506e-2d78-47fc-8b9c-6e5336323503
Molinari, Michaël
43f676c4-6e24-496e-9e6e-cc7453cca535
Mallet, Jeremy
99a096bc-7589-46d3-a40c-6bf91a8da79c
Thomas, Shibin
f9dd0751-582b-4c35-9725-36fbe08bbda8
Kowalski, Damian
b8ff506e-2d78-47fc-8b9c-6e5336323503
Molinari, Michaël
43f676c4-6e24-496e-9e6e-cc7453cca535
Mallet, Jeremy
99a096bc-7589-46d3-a40c-6bf91a8da79c

Thomas, Shibin, Kowalski, Damian, Molinari, Michaël and Mallet, Jeremy (2018) Role of electrochemical process parameters on the electrodeposition of silicon from 1-butyl-1-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide ionic liquid. Electrochimica Acta, 265, 166-174. (doi:10.1016/j.electacta.2018.01.139).

Record type: Article

Abstract

The electrodeposition from Room Temperature Ionic Liquids (RTILs) has recently emerged as a low cost technique for the growth of group IV thin films or nanostructures giving some promising alternative to classical physical vapour or chemical vapour deposition techniques. As a relatively new field of research, only few studies exist describing the growth mechanism of electrodeposition from RTILs, especially for Si films. In the present work, Cyclic Voltammetry (CV), Electrochemical Quartz Crystal Microbalance (EQCM) and potentiostatic electrodeposition techniques have been used to study the role of the applied potential, the concentration of electroactive species, the temperature, and the use of organic additive on the electrodeposition of Si from 1-butyl-1-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide ionic liquid. The demonstrated investigation of the influence of these parameters on the purity and morphological features gives a better control over the growth of Si thin films and optimizes the technique to grow Si with structural properties suitable for specific applications.

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More information

Accepted/In Press date: 22 January 2018
e-pub ahead of print date: 20 February 2018
Published date: 1 March 2018
Keywords: Electrodeposition, Growth parameters, Ionic liquid, Silicon

Identifiers

Local EPrints ID: 424772
URI: http://eprints.soton.ac.uk/id/eprint/424772
ISSN: 0013-4686
PURE UUID: f52b4d0d-5750-4870-ad9b-80de7cee8421
ORCID for Shibin Thomas: ORCID iD orcid.org/0000-0002-7735-788X

Catalogue record

Date deposited: 05 Oct 2018 11:45
Last modified: 28 Apr 2022 02:25

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Contributors

Author: Shibin Thomas ORCID iD
Author: Damian Kowalski
Author: Michaël Molinari
Author: Jeremy Mallet

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