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3D fin waveguide on 10nm gate oxide bonded double-SOI for low VΠL accumulation modulator

3D fin waveguide on 10nm gate oxide bonded double-SOI for low VΠL accumulation modulator
3D fin waveguide on 10nm gate oxide bonded double-SOI for low VΠL accumulation modulator
We propose a new design for a low VπL accumulation optical modulator using 3-Dimensional (3D) Fin-waveguides on double Silicon-On-Insulator (SOI). We have introduced and demonstrated a novel, self-aligned patterning process to pattern the bottom SOI layer using anisotropic wet etching.
1-2
Byers, J.
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Debnath, K.
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Arimoto, H.
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Husain, M.K.
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Sotto, M.
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Liu, F.
beec7ff8-5835-4793-981b-fafd99b52549
Khokhar, A.
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Kiang, K.
fdb609c6-75aa-4893-85c8-8e50edfda7fe
Boden, S.A.
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Thomson, D.J.
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Reed, G.T.
ca08dd60-c072-4d7d-b254-75714d570139
Saito, S.
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Li, Zuo
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Byers, J.
124172c9-0709-4cb9-992e-acedc2eb02bf
Debnath, K.
aa01749d-524b-4464-b90a-af072e92a02f
Arimoto, H.
1a276a3d-8a9e-4064-865f-eeacff82acc6
Husain, M.K.
92db1f76-6760-4cf2-8e30-5d4a602fe15b
Sotto, M.
2e7797fc-4433-4513-bd08-03ab7839452c
Liu, F.
beec7ff8-5835-4793-981b-fafd99b52549
Khokhar, A.
2eedd1cc-8ac5-4f8e-be25-930bd3eae396
Kiang, K.
fdb609c6-75aa-4893-85c8-8e50edfda7fe
Boden, S.A.
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Thomson, D.J.
17c1626c-2422-42c6-98e0-586ae220bcda
Reed, G.T.
ca08dd60-c072-4d7d-b254-75714d570139
Saito, S.
14a5d20b-055e-4f48-9dda-267e88bd3fdc
Li, Zuo
05f14f5e-fc6e-446e-ac52-64be640b5e42

Byers, J., Debnath, K., Arimoto, H., Husain, M.K., Sotto, M., Liu, F., Khokhar, A., Kiang, K., Boden, S.A., Thomson, D.J., Reed, G.T., Saito, S. and Li, Zuo (2018) 3D fin waveguide on 10nm gate oxide bonded double-SOI for low VΠL accumulation modulator. 15th International Conference on Group IV Photonics (GFP), , Cancun, Mexico. 29 - 31 Aug 2018. pp. 1-2 . (doi:10.1109/GROUP4.2018.8478693).

Record type: Conference or Workshop Item (Other)

Abstract

We propose a new design for a low VπL accumulation optical modulator using 3-Dimensional (3D) Fin-waveguides on double Silicon-On-Insulator (SOI). We have introduced and demonstrated a novel, self-aligned patterning process to pattern the bottom SOI layer using anisotropic wet etching.

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More information

Accepted/In Press date: 2018
e-pub ahead of print date: August 2018
Published date: 4 October 2018
Venue - Dates: 15th International Conference on Group IV Photonics (GFP), , Cancun, Mexico, 2018-08-29 - 2018-08-31

Identifiers

Local EPrints ID: 426359
URI: http://eprints.soton.ac.uk/id/eprint/426359
PURE UUID: 9507238d-9399-4c4b-b893-fcafbcf7bd23
ORCID for F. Liu: ORCID iD orcid.org/0000-0003-4443-9720
ORCID for K. Kiang: ORCID iD orcid.org/0000-0002-7326-909X
ORCID for S.A. Boden: ORCID iD orcid.org/0000-0002-4232-1828
ORCID for S. Saito: ORCID iD orcid.org/0000-0003-1539-1182

Catalogue record

Date deposited: 26 Nov 2018 17:30
Last modified: 16 Mar 2024 04:11

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Contributors

Author: J. Byers
Author: K. Debnath
Author: H. Arimoto
Author: M.K. Husain
Author: M. Sotto
Author: F. Liu ORCID iD
Author: A. Khokhar
Author: K. Kiang ORCID iD
Author: S.A. Boden ORCID iD
Author: D.J. Thomson
Author: G.T. Reed
Author: S. Saito ORCID iD
Author: Zuo Li

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