Optical waveguides by germanium ion implantation on silicon-on-insulator platform
Optical waveguides by germanium ion implantation on silicon-on-insulator platform
We demonstrated a new type of integrated photonic waveguides formed by Ge ion implantation in the silicon slab on silicon-on-insulator platform. They were successfully fabricated and characterised, and can be potentially erased by laser annealing.
Chen, Xia
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Milošević, Milan M.
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Khokhar, Ali Z.
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Thomson, David J.
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Reed, Graham T.
ca08dd60-c072-4d7d-b254-75714d570139
2018
Chen, Xia
64f6ab92-ca11-4489-8c03-52bc986209ae
Milošević, Milan M.
b28da945-84a5-4317-8896-6d9ea6a69589
Khokhar, Ali Z.
2eedd1cc-8ac5-4f8e-be25-930bd3eae396
Thomson, David J.
17c1626c-2422-42c6-98e0-586ae220bcda
Reed, Graham T.
ca08dd60-c072-4d7d-b254-75714d570139
Chen, Xia, Milošević, Milan M., Khokhar, Ali Z., Thomson, David J. and Reed, Graham T.
(2018)
Optical waveguides by germanium ion implantation on silicon-on-insulator platform.
In CLEO Pacific Rim Conference 2018.
OSA..
(doi:10.1364/CLEOPR.2018.Th3C.3).
Record type:
Conference or Workshop Item
(Paper)
Abstract
We demonstrated a new type of integrated photonic waveguides formed by Ge ion implantation in the silicon slab on silicon-on-insulator platform. They were successfully fabricated and characterised, and can be potentially erased by laser annealing.
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More information
Published date: 2018
Additional Information:
Part F113-CLEOPR 2018. From the session Germinum Modulators and Ge Photonics (Th3C)
Venue - Dates:
Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2018, Hong Kong Convention and Exhibition Centre, Hong Kong, China, 2018-07-29 - 2018-08-03
Identifiers
Local EPrints ID: 427598
URI: http://eprints.soton.ac.uk/id/eprint/427598
PURE UUID: 4aa244e1-a8e1-4180-a190-1276acb8a1f8
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Date deposited: 24 Jan 2019 17:30
Last modified: 16 Mar 2024 00:03
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Contributors
Author:
Xia Chen
Author:
Milan M. Milošević
Author:
Ali Z. Khokhar
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