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Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices

Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices
Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices

We demonstrate low-loss hydrogenated amorphous silicon (a-Si:H) waveguides by hot-wire chemical vapor deposition (HWCVD). The effect of hydrogenation in a-Si at different deposition temperatures has been investigated and analyzed by Raman spectroscopy. We obtained an optical quality a-Si:H waveguide deposited at 230°C that has a strong Raman peak shift at 480 cm−1, peak width (full width at half-maximum) of 68.9 cm−1, and bond angle deviation of 8.98°. Optical transmission measurement shows a low propagation loss of 0.8 dB/cm at the 1550 nm wavelength, which is the first, to our knowledge, report for a HWCVD a-Si:H waveguide.

2327-9125
193-200
Oo, Swe Z.
6495f6da-8f17-4484-98fb-6151b4efbd9a
Tarazona, Antulio
c6ae87c5-c746-4f89-9ff0-9e7b6874e94f
Khokhar, Ali Z.
2eedd1cc-8ac5-4f8e-be25-930bd3eae396
Petra, Rafidah
82dc1d3d-9f9e-4cd9-832f-9d7f1a36fcc6
Franz, Yohann
edb6208c-9f65-42c4-965e-b6bc54945602
Mashanovich, Goran Z.
c806e262-af80-4836-b96f-319425060051
Reed, Graham T.
ca08dd60-c072-4d7d-b254-75714d570139
Peacock, Anna C.
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Chong, Harold M.H.
795aa67f-29e5-480f-b1bc-9bd5c0d558e1
Oo, Swe Z.
6495f6da-8f17-4484-98fb-6151b4efbd9a
Tarazona, Antulio
c6ae87c5-c746-4f89-9ff0-9e7b6874e94f
Khokhar, Ali Z.
2eedd1cc-8ac5-4f8e-be25-930bd3eae396
Petra, Rafidah
82dc1d3d-9f9e-4cd9-832f-9d7f1a36fcc6
Franz, Yohann
edb6208c-9f65-42c4-965e-b6bc54945602
Mashanovich, Goran Z.
c806e262-af80-4836-b96f-319425060051
Reed, Graham T.
ca08dd60-c072-4d7d-b254-75714d570139
Peacock, Anna C.
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Chong, Harold M.H.
795aa67f-29e5-480f-b1bc-9bd5c0d558e1

Oo, Swe Z., Tarazona, Antulio, Khokhar, Ali Z., Petra, Rafidah, Franz, Yohann, Mashanovich, Goran Z., Reed, Graham T., Peacock, Anna C. and Chong, Harold M.H. (2018) Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices. Photonics Research, 7 (2), 193-200. (doi:10.1364/PRJ.7.000193).

Record type: Article

Abstract

We demonstrate low-loss hydrogenated amorphous silicon (a-Si:H) waveguides by hot-wire chemical vapor deposition (HWCVD). The effect of hydrogenation in a-Si at different deposition temperatures has been investigated and analyzed by Raman spectroscopy. We obtained an optical quality a-Si:H waveguide deposited at 230°C that has a strong Raman peak shift at 480 cm−1, peak width (full width at half-maximum) of 68.9 cm−1, and bond angle deviation of 8.98°. Optical transmission measurement shows a low propagation loss of 0.8 dB/cm at the 1550 nm wavelength, which is the first, to our knowledge, report for a HWCVD a-Si:H waveguide.

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prj-7-2-193 - Accepted Manuscript
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More information

Accepted/In Press date: 18 December 2018
e-pub ahead of print date: 21 December 2018

Identifiers

Local EPrints ID: 430819
URI: https://eprints.soton.ac.uk/id/eprint/430819
ISSN: 2327-9125
PURE UUID: 1df27ff2-97a0-4283-bb66-833aa85053cf
ORCID for Anna C. Peacock: ORCID iD orcid.org/0000-0002-1940-7172
ORCID for Harold M.H. Chong: ORCID iD orcid.org/0000-0002-7110-5761

Catalogue record

Date deposited: 15 May 2019 16:30
Last modified: 03 Dec 2019 01:51

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