Angled MMI CWDM structure on germanium on silicon
Angled MMI CWDM structure on germanium on silicon
There are several examples of angled multimode intereferometers (AMMI) [1, 2], arrayed waveguide gratings (AWGs) [3] and echelle gratings/planar concave gratings (PCGs) [4] in SOI, as these are the most widely used components for performing wavelength division multiplexing [5]. While the last two usually require an extra lithography step to improve insertion loss and crosstalk as well as a very fine control of the fabrication procedure to improve the spectral response, the AMMI requires a single lithography and etching step and it is more tolerant to fabrication errors. In this paper we demonstrate the first AMMI fabricated in the germanium-on-silicon material platform.
Optical Society of America
Soler Penadés, J.
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Hu, Youfang
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Nedeljković, Miloš
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Littlejohns, Callum G.
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Khokhar, Ali Z.
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Mitchell, Colin J.
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Stanković, Stevan
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Roelkens, Gunther
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Gardes, Frederic Y.
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Mashanovich, Goran Z.
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25 June 2015
Soler Penadés, J.
f18f3619-0d71-4547-95fd-dd38c37b7adb
Hu, Youfang
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Nedeljković, Miloš
b64e21c2-1b95-479d-a35c-3456dff8c796
Littlejohns, Callum G.
d2837f04-0a83-4bf9-acb2-618aa42a0cad
Khokhar, Ali Z.
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Mitchell, Colin J.
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Stanković, Stevan
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Roelkens, Gunther
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Gardes, Frederic Y.
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Mashanovich, Goran Z.
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Soler Penadés, J., Hu, Youfang, Nedeljković, Miloš, Littlejohns, Callum G., Khokhar, Ali Z., Mitchell, Colin J., Stanković, Stevan, Roelkens, Gunther, Gardes, Frederic Y. and Mashanovich, Goran Z.
(2015)
Angled MMI CWDM structure on germanium on silicon.
In Proceedings 2015 European Conference on Lasers and Electro-Optics - European Quantum Electronics Conference, CLEO/Europe-EQEC 2015.
Optical Society of America..
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Conference or Workshop Item
(Paper)
Abstract
There are several examples of angled multimode intereferometers (AMMI) [1, 2], arrayed waveguide gratings (AWGs) [3] and echelle gratings/planar concave gratings (PCGs) [4] in SOI, as these are the most widely used components for performing wavelength division multiplexing [5]. While the last two usually require an extra lithography step to improve insertion loss and crosstalk as well as a very fine control of the fabrication procedure to improve the spectral response, the AMMI requires a single lithography and etching step and it is more tolerant to fabrication errors. In this paper we demonstrate the first AMMI fabricated in the germanium-on-silicon material platform.
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Published date: 25 June 2015
Venue - Dates:
CLEO/Europe-EQEC 2015, ICM Centre, Munich, Germany, 2015-06-21 - 2015-06-25
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Local EPrints ID: 431468
URI: http://eprints.soton.ac.uk/id/eprint/431468
PURE UUID: d1f97896-2e48-472b-8aec-91a6a6a42a66
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Date deposited: 05 Jun 2019 16:30
Last modified: 06 Mar 2024 02:49
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Contributors
Author:
J. Soler Penadés
Author:
Youfang Hu
Author:
Ali Z. Khokhar
Author:
Stevan Stanković
Author:
Gunther Roelkens
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