Direct UV written integrated planar waveguides using a 213 nm laser

Abstract

We present the first demonstration of integrated waveguides in planar silica devices fabricated using direct UV writing with 213 nm laser light. Waveguides were produced with different writing fluences and the NA and MFD of each were measured. Single mode waveguides were achieved at fluence values one tenth that typically required when operating with a 244 nm laser, allowing for more rapid fabrication. A maximum in-plane index change of 2.4 x10^-3 for a writing fluence of 5 kJ cm^-2 was estimated from NA measurements. Finally cutback measurements were performed and a propagation loss of 0.42 ± 0.07 dB/cm was directly measured, though losses as low as 0.2 ± 0.03 dB/cm are indicated through calculations.

More information

Identifiers

Catalogue record

Export record

ASCII CitationAtomBibTeXData Cite XMLDublin CoreDublin CoreEP3 XMLEndNoteHTML CitationHTML CitationHTML ListJSONMETSMODSMPEG-21 DIDLOpenURL ContextObjectOpenURL ContextObject in SpanRDF+N-TriplesRDF+N3RDF+XMLRIOXX2 XMLReferReference ManagerSimple Metadata

Altmetrics