Megahertz x-ray microscopy at x-ray free-electron laser and synchrotron sources
Megahertz x-ray microscopy at x-ray free-electron laser and synchrotron sources
Modern emerging technologies, such as additive manufacturing, bioprinting, and new material production, require novel metrology tools to probe fundamental high-speed dynamics happening in such systems. Here we demonstrate the application of the megahertz (MHz) European X-ray Free-Electron Laser (EuXFEL) to image the fast stochastic processes induced by a laser on water-filled capillaries with micrometer-scale spatial resolution. The EuXFEL provides superior contrast and spatial resolution compared to equivalent state-of-the-art synchrotron experiments. This work opens up new possibilities for the characterization of MHz stochastic processes on the nanosecond to microsecond time scales with object velocities up to a few kilometers per second using XFEL sources.
1106-1109
Vagovič, Patrik
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Sato, Tokushi
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Mikeš, Ladislav
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Mills, Grant
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Graceffa, Rita
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Mattsson, Frans
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Villanueva-Perez, Pablo
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Ershov, Alexey
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Faragó, Tomáš
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Uličný, Jozef
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Kirkwood, Henry
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Letrun, Romain
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Mokso, Rajmund
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Zdora, Marie Christine
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Olbinado, Margie P.
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Rack, Alexander
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Baumbach, Tilo
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Schulz, Joachim
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Meents, Alke
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Chapman, Henry N.
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Mancuso, Adrian P.
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23 August 2019
Vagovič, Patrik
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Sato, Tokushi
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Mikeš, Ladislav
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Mills, Grant
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Graceffa, Rita
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Mattsson, Frans
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Villanueva-Perez, Pablo
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Ershov, Alexey
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Faragó, Tomáš
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Uličný, Jozef
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Kirkwood, Henry
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Letrun, Romain
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Mokso, Rajmund
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Zdora, Marie Christine
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Olbinado, Margie P.
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Rack, Alexander
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Baumbach, Tilo
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Schulz, Joachim
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Meents, Alke
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Chapman, Henry N.
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Mancuso, Adrian P.
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Vagovič, Patrik, Sato, Tokushi, Mikeš, Ladislav, Mills, Grant, Graceffa, Rita, Mattsson, Frans, Villanueva-Perez, Pablo, Ershov, Alexey, Faragó, Tomáš, Uličný, Jozef, Kirkwood, Henry, Letrun, Romain, Mokso, Rajmund, Zdora, Marie Christine, Olbinado, Margie P., Rack, Alexander, Baumbach, Tilo, Schulz, Joachim, Meents, Alke, Chapman, Henry N. and Mancuso, Adrian P.
(2019)
Megahertz x-ray microscopy at x-ray free-electron laser and synchrotron sources.
Optica, 6 (9), .
(doi:10.1364/OPTICA.6.001106).
Abstract
Modern emerging technologies, such as additive manufacturing, bioprinting, and new material production, require novel metrology tools to probe fundamental high-speed dynamics happening in such systems. Here we demonstrate the application of the megahertz (MHz) European X-ray Free-Electron Laser (EuXFEL) to image the fast stochastic processes induced by a laser on water-filled capillaries with micrometer-scale spatial resolution. The EuXFEL provides superior contrast and spatial resolution compared to equivalent state-of-the-art synchrotron experiments. This work opens up new possibilities for the characterization of MHz stochastic processes on the nanosecond to microsecond time scales with object velocities up to a few kilometers per second using XFEL sources.
Text
optica-6-9-1106
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Accepted/In Press date: 26 July 2019
Published date: 23 August 2019
Identifiers
Local EPrints ID: 438963
URI: http://eprints.soton.ac.uk/id/eprint/438963
ISSN: 2334-2536
PURE UUID: 69ae9d07-5fb4-4f87-8c93-aade88a6a91b
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Date deposited: 30 Mar 2020 16:30
Last modified: 16 Mar 2024 07:11
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Contributors
Author:
Patrik Vagovič
Author:
Tokushi Sato
Author:
Ladislav Mikeš
Author:
Grant Mills
Author:
Rita Graceffa
Author:
Frans Mattsson
Author:
Pablo Villanueva-Perez
Author:
Alexey Ershov
Author:
Tomáš Faragó
Author:
Jozef Uličný
Author:
Henry Kirkwood
Author:
Romain Letrun
Author:
Rajmund Mokso
Author:
Marie Christine Zdora
Author:
Margie P. Olbinado
Author:
Alexander Rack
Author:
Tilo Baumbach
Author:
Joachim Schulz
Author:
Alke Meents
Author:
Henry N. Chapman
Author:
Adrian P. Mancuso
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