Laser-written silicon-germanium alloy microstructures with tunable compositionally graded profiles
Laser-written silicon-germanium alloy microstructures with tunable compositionally graded profiles
A laser processing method is introduced for post-deposition tailoring of local composition and bandgap in amorphous silicon-germanium thin films on silicon substrates. Spatial distribution of the alloy constituents can be controlled through the scan speed.
Si-Ge, Laser writing, graded composition, semiconductor alloys, thin film, phase segregation
Aktaş, Ozan
2e90db41-f409-431f-9827-2e2577a52457
MacFarquhar, Stuart, James
cff30fb5-a4b6-44ab-b1b3-138e7020fba3
Oo, Swe Zin
6495f6da-8f17-4484-98fb-6151b4efbd9a
Mittal, Vinita
fd5ee9dd-7770-416f-8f47-50ca158b39b0
Chong, Harold
795aa67f-29e5-480f-b1bc-9bd5c0d558e1
Peacock, Anna
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Aktaş, Ozan
2e90db41-f409-431f-9827-2e2577a52457
MacFarquhar, Stuart, James
cff30fb5-a4b6-44ab-b1b3-138e7020fba3
Oo, Swe Zin
6495f6da-8f17-4484-98fb-6151b4efbd9a
Mittal, Vinita
fd5ee9dd-7770-416f-8f47-50ca158b39b0
Chong, Harold
795aa67f-29e5-480f-b1bc-9bd5c0d558e1
Peacock, Anna
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Aktaş, Ozan, MacFarquhar, Stuart, James, Oo, Swe Zin, Mittal, Vinita, Chong, Harold and Peacock, Anna
(2020)
Laser-written silicon-germanium alloy microstructures with tunable compositionally graded profiles.
CLEO: Science and Innovations 2020, San Jose Convention Center, San Jose, United States.
10 - 15 May 2020.
2 pp
.
Record type:
Conference or Workshop Item
(Other)
Abstract
A laser processing method is introduced for post-deposition tailoring of local composition and bandgap in amorphous silicon-germanium thin films on silicon substrates. Spatial distribution of the alloy constituents can be controlled through the scan speed.
Text
OA_CLEO2020_abstract_V3
- Accepted Manuscript
Video
video_OzanAktas_CLEO2020
More information
e-pub ahead of print date: 15 May 2020
Venue - Dates:
CLEO: Science and Innovations 2020, San Jose Convention Center, San Jose, United States, 2020-05-10 - 2020-05-15
Keywords:
Si-Ge, Laser writing, graded composition, semiconductor alloys, thin film, phase segregation
Identifiers
Local EPrints ID: 440609
URI: http://eprints.soton.ac.uk/id/eprint/440609
PURE UUID: 6d12532e-2b27-4af8-a6c8-abd12aaf7d85
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Date deposited: 12 May 2020 16:35
Last modified: 06 Jun 2024 01:45
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