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Low-loss silicon waveguides and grating couplers fabricated using anisotropic wet etching technique

Low-loss silicon waveguides and grating couplers fabricated using anisotropic wet etching technique
Low-loss silicon waveguides and grating couplers fabricated using anisotropic wet etching technique
We report low-loss silicon waveguides and efficient grating coupler to couple light into them. By using anisotropic wet etching technique, we reduced the side wall roughness down to 1.2 nm. The waveguides were patterned along the [112] direction on a [110] silicon-on-insulator substrate. The waveguide boundaries are decided by the [111] planes, which are normal to the [110] surface. Fabricated waveguides show minimum propagation loss of 0.85 dB/cm for TE polarization and 1.08 dB/cm for TM polarization. The fabricated grating couplers show coupling efficiency of ~4.16 dB at 1570 nm with 3 dB bandwidth of 46 nm.
1-7
Debnath, Kapil
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Arimoto, Hideo
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Husain, Muhammad K.
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Prasmusinto, Alyssa
ff88144e-545a-471d-b92c-f31064a33a44
Al-Attili, Abdelrahman
534a1c1f-3f8c-4a78-b71b-50c156e23373
Petra, Rafidah
82dc1d3d-9f9e-4cd9-832f-9d7f1a36fcc6
Chong, Harold M.H.
795aa67f-29e5-480f-b1bc-9bd5c0d558e1
Reed, Graham T.
ca08dd60-c072-4d7d-b254-75714d570139
Saito, Shinichi
14a5d20b-055e-4f48-9dda-267e88bd3fdc
Debnath, Kapil
aa01749d-524b-4464-b90a-af072e92a02f
Arimoto, Hideo
b88aab51-ad62-4127-9ca5-d86e3d714531
Husain, Muhammad K.
92db1f76-6760-4cf2-8e30-5d4a602fe15b
Prasmusinto, Alyssa
ff88144e-545a-471d-b92c-f31064a33a44
Al-Attili, Abdelrahman
534a1c1f-3f8c-4a78-b71b-50c156e23373
Petra, Rafidah
82dc1d3d-9f9e-4cd9-832f-9d7f1a36fcc6
Chong, Harold M.H.
795aa67f-29e5-480f-b1bc-9bd5c0d558e1
Reed, Graham T.
ca08dd60-c072-4d7d-b254-75714d570139
Saito, Shinichi
14a5d20b-055e-4f48-9dda-267e88bd3fdc

Debnath, Kapil, Arimoto, Hideo, Husain, Muhammad K., Prasmusinto, Alyssa, Al-Attili, Abdelrahman, Petra, Rafidah, Chong, Harold M.H., Reed, Graham T. and Saito, Shinichi (2016) Low-loss silicon waveguides and grating couplers fabricated using anisotropic wet etching technique. Frontiers in Materials, 3, 1-7, [10]. (doi:10.3389/fmats.2016.00010).

Record type: Article

Abstract

We report low-loss silicon waveguides and efficient grating coupler to couple light into them. By using anisotropic wet etching technique, we reduced the side wall roughness down to 1.2 nm. The waveguides were patterned along the [112] direction on a [110] silicon-on-insulator substrate. The waveguide boundaries are decided by the [111] planes, which are normal to the [110] surface. Fabricated waveguides show minimum propagation loss of 0.85 dB/cm for TE polarization and 1.08 dB/cm for TM polarization. The fabricated grating couplers show coupling efficiency of ~4.16 dB at 1570 nm with 3 dB bandwidth of 46 nm.

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Accepted/In Press date: 8 February 2016
e-pub ahead of print date: 22 February 2016
Published date: 2016

Identifiers

Local EPrints ID: 441687
URI: http://eprints.soton.ac.uk/id/eprint/441687
PURE UUID: d541b2ff-a3c2-4c0e-9e7e-236cf9448204
ORCID for Harold M.H. Chong: ORCID iD orcid.org/0000-0002-7110-5761
ORCID for Shinichi Saito: ORCID iD orcid.org/0000-0003-1539-1182

Catalogue record

Date deposited: 24 Jun 2020 16:30
Last modified: 07 Oct 2020 06:55

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Contributors

Author: Kapil Debnath
Author: Hideo Arimoto
Author: Muhammad K. Husain
Author: Alyssa Prasmusinto
Author: Abdelrahman Al-Attili
Author: Rafidah Petra
Author: Harold M.H. Chong ORCID iD
Author: Graham T. Reed
Author: Shinichi Saito ORCID iD

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