Developing an EUV multilayer adaptive mirror: the first results

Corso, A.J., Bonora, S., Zuppella, P., Baksh, P., Miszczak, M., Brocklesby, W.S., Zhanshan, W., Nicolosi, P. and Pelizzo, M.G. (2016) Developing an EUV multilayer adaptive mirror: the first results. Conference on Advances in X-Ray/EUV Optics and Components XI : (held as part of the SPIE International Symposium on Optics + Photonics), , San Diego, CA. 31 Aug - 01 Sep 2016. 7 pp . (doi:10.1117/12.2238541).

Abstract

The growing interest in the study of the extreme ultraviolet (EUV) radiation-matter interaction is feeding up the development of new technologies able to overcame some current technological limits. Adaptive optics is an established technology already widely used for wavefront correction in many applications such as astronomical telescopes, laser communications, high power laser systems, microscopy and high resolution imaging systems. Although this technology is already exploited in the EUV and X-ray range, its usage is only feasible in systems with a grazing incidence configuration. On the other hand, the development of a EUV normal incidence adaptive optics can open new interesting possibilities in many different fields ranging from free electron laser and synchrotron applications up to EUV photolithography. In this work we report the preliminary results achieved in the developing of a normal incidence EUV multilayered adaptive mirror tuned at 30.4nm. The proper functioning and potential applications of such device have been demonstrated by using a High order Harmonics Generation (HHG) source.

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Contributors

Author: W.S. Brocklesby

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