213 nm laser written waveguides in Ge-doped planar silica without hydrogen loading

Abstract

In this paper we present the first example of waveguides fabricated by UV writing in non-hydrogen loaded Ge-doped planar silica with 213 nm light. Single mode waveguides were fabricated and the numerical apertures and mode field diameters were measured for a range of writing fluences. A peak index change of 5.3 x 10 ⁻³ was inferred for the waveguide written with 70 kJ cm ⁻². The refractive index change is sufficient to match the index structure of standard optical fiber. Uniformity of the written structures was measured and a propagation loss of 0.39 ± 0.03 dB cm ⁻¹ was determined through cutback measurements.

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