Physical vapor deposition method for the high-throughput synthesis of solid-state material libraries
Physical vapor deposition method for the high-throughput synthesis of solid-state material libraries
A method that combines coevaporation of pure elements from multiple finite-size sources on temperature-controlled substrates with independently controlled source shutters has been used for the synthesis of solid-state material combinatorial libraries. The source shutters are positioned to achieve a controlled gradient of the deposited elements across the substrate and are fixed during the course of deposition. Choice of the shutter position and the rate of deposition for each source allow the direct synthesis of continuous and controlled materials of varying composition. There are significant advantages of the method over alternatives which rely on sequential deposition and subsequent heat treatment to produce thin film materials. The parameters governing the creation of gradients have been identified and defined. Simulations and experimental data have been compared in the case of a single source. Results are presented for the synthesis of a ternary alloy library to demonstrate the methodology.
molecular-beam epitaxy, composition-spread approach, thin-film
libraries, phase-diagrams, combinatorial synthesis, discovery, optimization, systems, alloys, growth
66-73
Guerin, Samuel
e185e0c2-85c6-4d1c-a2cf-cd2f410d346f
Hayden, Brian E.
aea74f68-2264-4487-9d84-5b12ddbbb331
2007
Guerin, Samuel
e185e0c2-85c6-4d1c-a2cf-cd2f410d346f
Hayden, Brian E.
aea74f68-2264-4487-9d84-5b12ddbbb331
Guerin, Samuel and Hayden, Brian E.
(2007)
Physical vapor deposition method for the high-throughput synthesis of solid-state material libraries.
Journal of Combinatorial Chemistry, 8 (1), .
(doi:10.1021/cc050117p).
Abstract
A method that combines coevaporation of pure elements from multiple finite-size sources on temperature-controlled substrates with independently controlled source shutters has been used for the synthesis of solid-state material combinatorial libraries. The source shutters are positioned to achieve a controlled gradient of the deposited elements across the substrate and are fixed during the course of deposition. Choice of the shutter position and the rate of deposition for each source allow the direct synthesis of continuous and controlled materials of varying composition. There are significant advantages of the method over alternatives which rely on sequential deposition and subsequent heat treatment to produce thin film materials. The parameters governing the creation of gradients have been identified and defined. Simulations and experimental data have been compared in the case of a single source. Results are presented for the synthesis of a ternary alloy library to demonstrate the methodology.
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Published date: 2007
Keywords:
molecular-beam epitaxy, composition-spread approach, thin-film
libraries, phase-diagrams, combinatorial synthesis, discovery, optimization, systems, alloys, growth
Identifiers
Local EPrints ID: 44453
URI: http://eprints.soton.ac.uk/id/eprint/44453
ISSN: 1520-4766
PURE UUID: 155ed75a-2e47-4e98-9cb2-395fba0eb84a
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Date deposited: 05 Mar 2007
Last modified: 16 Mar 2024 02:36
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Author:
Samuel Guerin
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